ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Formation of polystyrene thin film by the synchrotron radiation chemical vapor-deposition method was investigated using a styrene monomer. Polystyrene film was deposited at the irradiated area and vicinity along the irradiated area on a Si substrate. The deposition rate depended on the monomer gas pressure, substrate temperature, and x-ray wavelength. Polystyrene film at the irradiated area was insoluble in benzene solvent, while that at the unirradiated area was easily dissolved. A patterned film deposition could be successfully performed under an irradiation of synchrotron radiation through a Ni mesh mask. The pattern profile was influenced by the gap length between the Si substrate and mask and a clear pattern was obtained after benzene treatment.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.345467