Note: Front Cover -- Silicon Epitaxy: Semiconductors and Semimetals -- Copyright Page -- Contents -- Preface -- List of Contributors -- Chapter 1. CVD Technologies For Silicon: A Quick Survey -- Abbreviations Used -- I. Introduction -- II. Bulk Polycrystalline Silicon Processes -- III. Film Deposition: Reactors -- IV. Film Deposition: Products and Chemistries -- V. Aerosol CVD -- VI. Conclusions -- References -- Chapter 2. Epitaxial Growth Theory: Vapor-phase and Surface Chemistry -- I. Introduction -- II. Development of a Detailed Kinetic Scheme -- III. Gas-phase Kinetics for Silanes and Chlorosilanes -- IV. Surface Kinetics for Silanes and Chlorosilanes -- V. Gas-phase Precursors to Deposition and Overall Kinetic Scheme -- VI. Overall Kinetic Scheme and Concluding Remarks -- References -- Chapter 3. Epitaxial Growth Facilities, Equipment, and Supplies -- Abbreviations Used -- I. Introduction -- II. The Epitaxial Reactor -- III. Facilities -- IV. Process Gas and Delivery -- V. Exhaust Treatment -- VI. Equipment for Power Epitaxy -- VII. Advanced Applications -- VIII. Conclusion -- References -- Chapter 4. Epitaxial Growth Techniques: Low-temperature Epitaxy -- Abbreviations Used -- I. Introduction -- II. CVD Machines -- III. Surface Treatment -- IV. Epitaxial Growth Mechanisms -- V. High-quality Si/Si1-x Gex/Si Heterostructure Growth at High Ge Fractions -- VI. Conclusions -- References -- Chapter 5. Epitaxial Growth Techniques: Molecular Beam Epitaxy -- Abbreviations Used -- I. Introduction -- II. MBE Machines -- III. Surface Treatment -- IV. Growth Mechanisms -- V. Doping -- VI. Growth of SiGe(C) Alloys -- VII. Formation of Si/Ge Heterostructures -- VIII. Growth of SiGe Buffer Layers -- IX. Selective Growth -- X. Formation of Superlattices, Quantum Wires, and Quantum Dots -- XI. Conclusion -- References -- Chapter 6. Epitaxial Growth Modeling. , Nomenclature -- I. Introduction -- II. Detailed Modeling of Epitaxial Reactors -- III. Reduced-order Models for Epitaxial Silicon Deposition -- IV. Atomistic Aspects: Control of Crystal Morphology -- V. Summary -- References -- Chapter 7. Epitaxiai Layer Characterization and Metrology -- Abbreviations Used -- I. Introduction -- II. On Sampling and Accuracy -- III. Doping Control -- IV. Thickness Measurements -- V. Contamination and Surface Quality -- VI. Future Developments and Conclusions -- References -- Chapter 8. Epitaxy for Discrete and Power Devices -- Nomenclature -- I. Introduction -- II. General Considerations -- III. Specific Epitaxy Processes for Power and Discrete Devices -- IV. Defects and Problems -- V. Accessory Considerations -- Chapter 9. Epitaxy on Patterned Wafers -- I. Introduction -- II. Device Requirements and Process Complexity -- III. Surface Preparation: Pre-epitaxial Cleaning -- IV. Geometrical Pattern Integrity -- V. Doping Pattern Integrity -- VI. Crystal Defectivity -- VII. Conclusion: The Best Epitaxial Recipe? -- Bibliography -- Chapter 10. Si-based Alloys: SiGe and SiGe:C -- I. Introduction -- II. Applications of Si Alloys -- III. Low-temperature Surface Preparation -- IV. Process Chemistry for Si Alloy Deposition -- V. Metrology of Si1-x Gex Layers -- VI. Production Robust Si1-x Gex Processing -- VII. Summary -- References -- Chapter 11. Silicon Epitaxy: New Applications -- I. Introduction -- II. Equipment: State of the Art -- III. Epitaxy Processes -- IV. New Applications -- V. Conclusion -- References -- Index -- Contents of Volumes In This Series -- Color Plate Section.

Note: Front Cover -- Processing and Properties of Compound Semiconductors: Semiconductors and Semimetals -- Copyright Page -- Contents -- List of Contributors -- Chapter 1. Introduction -- 1. Introduction -- 2. Wet Etching -- References -- Chapter 2. Gallium Arsenide Heterostructures -- 1. Introduction -- 2. Crystal Growth and Properties of GaAs -- 3. Growth and Material Properties of GaAs Heterostructures -- 4. Physical Properties of GaAs-Based Quantum Well Structures and Superlattices -- References -- Chapter 3. Growth and Optical Properties of GaN -- 1. Introduction -- 2. Gallium Nitride and its Growth on Different Substrates -- 3. Line Width and Quantum Beats in GaN -- 4. Time-Resolved Spectroscopy of GaN Epilayers -- 5. p-GaN -- 6. n-GaN -- 7. Optical Pumping and Lasing in GaN Epilayers and Heterostructures -- 8. GaN Quantum Wells -- References -- Chapter 4. SiGe/Si Processing -- 1. Introduction -- 2. SiGe/Si Material Properties and Processing Challenges -- References -- Chapter 5. Advances in Quantum Dot Structures -- 1. Introduction -- 2. Physical Properties -- 3. State of the Art -- References -- Chapter 6. Wet Etching of III-V Semiconductors -- 1. Introduction -- 2. Semiconductor Electrochemistry: Basic Principles and Experimental Methods -- 3. Types of Etching Reactions -- 4. Some Solid-State and Electrochemical Data on III-V Semiconductors -- 5. Kinetics and Mechanisms of Etching Reactions at III-V Semiconductors -- 6. Material-Selective Etching -- 7. Etch Morphologies and Profiles -- 8. Conclusions -- References -- Index -- Contents of Volumes in This Series.

Note: Ab 1960 herausgegeben von M. Alfert, H. Bauer,

Note: Cover -- Half Title -- Title Page -- Copyright Page -- Preface -- The Author -- Contributors -- Table of Contents -- Section 1: Crystalline Materials -- 1.1 Introduction -- 1.2 Physical Properties -- 1.2.1 Isotropic Crystals -- 1.2.2 Uniaxial Crystals -- 1.2.3 Biaxial Crystals -- 1.3 Optical Properties -- 1.3.1 Isotropic Crystals -- 1.3.2 Uniaxial Crystals -- 1.3.3 Biaxial Crystals -- 1.3.4 Dispersion Formulas for Refractive Index -- 1.3.5 Thermooptic Coefficients -- 1.4 Mechanical Properties -- 1.4.1 Elastic Constants -- 1.4.2 Elastic Moduli -- 1.4.3 Engineering Data -- 1.5 Thermal Properties -- 1.5.1 Melting Point, Heat Capacity, Thermal Expansion, Conductivity -- 1.5.2 Temperature Dependence of Heat Capacity for Selected Solids -- 1.5.3 Debye Temperature -- 1.6 Magnetooptic Properties -- 1.6.1 Diamagnetic Crystals -- 1.6.2 Paramagnetic Crystals -- 1.6.3 Ferromagnetic, Antiferromagnetic, and Ferrimagnetic Crystals -- 1.7 Electrooptic Properties -- 1.7.1 Linear Electrooptic Coefficients -- 1.7.2 Quadratic Electrooptic Materials -- 1.8 Elastrooptic Properties -- 1.8.1 Elastooptic Coefficients -- 1.8.2 Acoustooptic Materials -- 1.9 Nonlinear Optical Properties -- 1.9.1 Nonlinear Refractive Index -- 1.9.2 Two-Photon Absorption -- 1.9.3 Second Harmonic Generation Coefficients -- 1.9.4 Third-Order Nonlinear Optical Coefficients -- 1.9.5 Optical Phase Conjugation Materials -- Section 2: Glasses -- 2.1 Introduction -- 2.2 Commercial Optical Glasses -- 2.2.1 Optical Properties -- 2.2.2 Internal Transmittance -- 2.2.3 Mechanical Properties -- 2.2.4 Thermal Properties -- 2.3 Specialty Optical Glasses -- 2.3.1 Optical Properties -- 2.3.2 Mechanical Properties -- 2.3.3 Thermal Properties -- 2.4 Fused Silica -- 2.5 Fluoride Glasses -- 2.5.1 Fluorozirconate Glasses -- 2.5.2 Fluorohafnate Glasses -- 2.5.3 Other Fluoride Glasses -- 2.6 Chalcogenide Glasses. , 2.7 Magnetooptic Properties -- 2.7.1 Diamagnetic Glasses -- 2.7.2 Paramagnetic Glasses -- 2.8 Electrooptic Properties -- 2.9 Elastooptic Properties -- 2.10 Nonlinear Optical Properties -- 2.10.1 Nonlinear Refractive Index -- 2.10.2 Two-Photon Absorption -- 2.10.3 Third-Order Nonlinear Optical Coefficients -- 2.10.4 Brillouin Phase Conjugation -- 2.11 Special Glasses -- 2.11.1 Filter Glasses -- 2.11.2 Laser Glasses -- 2.11.3 Faraday Rotator Glasses -- 2.11.4 Gradient-Index Glasses -- 2.11.5 Mirror Substrate Glasses -- 2.11.6 Athermal Glasses -- 2.11.7 Acoustooptic Glasses -- 2.11.8 Abnormal Dispersion Glasses -- Section 3: Polymeric Materials -- 3.1 Optical Plastics -- 3.2 Index of Refraction -- 3.3 Nonlinear Optical Properties -- 3.4 Thermal Properties -- 3.5 Engineering Data -- Section 4: Metals -- 4.1 Physical Properties of Selected Metals -- 4.2 Optical Properties -- 4.3 Mechanical Properties -- 4.4 Thermal Properties -- 4.5 Mirror Substrate Materials -- Section 5: Liquids -- 5.1 Introduction -- 5.2 Water -- 5.2.1 Physical Properties -- 5.2.2 Absorption -- 5.2.3 Index of Refraction -- 5.3 Physical Properties of Selected Liquids -- 5.3.1 Thermal Conductivity -- 5.3.2 Viscosity -- 5.3.3 Surface Tension -- 5.3.4 Absorption -- 5.4 Index of Refraction -- 5.4.1 Organic Liquids -- 5.4.2 Inorganic Liquids -- 5.4.3 Calibration Liquids -- 5.4.4 Abnormal Dispersion Liquids -- 5.5 Nonlinear Optical Properties -- 5.5.1 Two-Photon Absorption Cross Sections -- 5.5.2 Nonlinear Refraction -- 5.5.3 Kerr Constants -- 5.5.4 Third-Order Nonlinear Optical Coefficients -- 5.5.5 Stimulated Raman Scattering -- 5.5.6 Stimulated Brillouin Scattering -- 5.6 Magnetooptic Properties -- 5.6.1 Verdet Constants of Inorganic Liquids -- 5.6.2 Verdet Constants of Organic Liquids -- 5.6.3 Dispersion of the Verdet Constants -- 5.7 Commercial Optical Liquids -- Section 6: Gases. , 6.1 Introduction -- 6.2 Physical Properties of Selected Gases -- 6.3 Index of Refraction -- 6.4 Nonlinear Optical Properties -- 6.4.1 Nonlinear Refractive Index -- 6.4.2 Two-Photon Absorption -- 6.4.3 Third-Order Nonlinear Optical Coefficients -- 6.4.4 Stimulated Raman Scattering -- 6.4.5 Brillouin Phase Conjugation -- 6.5 Magnetooptic Properties -- 6.6 Atomic Resonance Filters -- Appendices -- Appendix I Safe Handling of Optical Materials -- Appendix II Abbreviations, Acronyms, Initialisms, and Mineralogical or Common Names of Optical Materials -- Appendix III Abbreviations for Methods of Preparing Optical Materials and Thin Films -- Appendix IV Fundamental Physical Constants -- Appendix V Units and Conversion Factors -- Index.

Note: Cover -- Title -- Copyright -- TABLE OF CONTENTS -- Foreword -- Preface -- The Editors -- Editorial Board -- Part 1: Lehmann's Phosphor Cookbook and Phosphor Tables -- Section 1: Introduction -- Section 2: Phosphor Preparation -- Section 3: Purification of Some Starting Materials -- Section 4: Phosphor Data -- Section 5: Preparation of Phosphor Screens -- Part 2: Additional Developments -- Section 6: Phosphor Synthesis -- Section 7: Other Phosphor Data -- Section 8: Commercial Phosphors and Scintillators -- Appendices -- Back Cover.

Note: Front Cover -- Ultrafast Physical Processes in Semiconductors -- Copyright Page -- Contents -- Preface -- List of Contributors -- Chapter 1. Ultrafast Electron-Phonon Interactions in Semiconductors: Quantum Kinetic Memory Effects -- I. Introduction -- II. General Considerations -- III. Experimental Technique -- IV. Results and Discussion -- V. Conclusion -- References -- Chapter 2. Spatially and Temporally Resolved Near-Field Scanning Optical Microscopy Studies of Semiconductor Quantum Wires -- I. Introduction -- II. Semiconductor Nanostructures -- III. Near-Field Scanning Optical Microscopy -- IV. Stationary Near-Field Spectroscopy of Semiconductor Nanostructures -- V. Time-Resolved Near-Field Spectroscopy -- VI. Outlook and Conclusions -- References -- Chapter 3. Ultrafast Dynamics in Wide Bandgap Wurtzite GaN -- I. Introduction -- II. Raman Spectroscopy in Semiconductors -- III. Samples, Experimental Setup, and Approach -- IV. Phonon Modes in the Wurtzite Structure GaN -- V. Experimental Results -- VI. Conclusions and Future Experiments -- References -- Chapter 4. Ultrafast Dynamics and Phase Changes in Highly Excited GaAs -- I. Introduction -- II. Measuring Ultrafast Phenomena with Light -- III. Dynamics of Electrons and Atoms from Femtoseconds to Microseconds -- IV. Measuring the Time-Resolved Dielectric Function -- V. Time-Resolved Dielectric Function of Highly Excited GaAs -- VI. Carrier and Lattice Dynamics -- VII. Conclusions -- References -- Chapter 5. Quantum Kinetics for Femtosecond Spectroscopy in Semiconductors -- I. Introduction -- II. Semiconductor Bloch Equations for Pulse Excitation with Quantum Kinetic Scattering Integrals -- III. Low-Excitation Femtosecond Spectroscopy -- IV. Femtosecond DTS for Screened Coulomb and LO-Phonon Quantum Kinetic Scattering. , V. Resonant FWM with Screened Coulomb and LO-Phonon Quantum Kinetic Scattering -- References -- Chapter 6. Coulomb Correlation Signatures in the Excitonic Optical Nonlinearities of Semiconductors -- I. Introduction -- II. Theoretical Approach and Model -- III. Applications to Pump-Probe Spectroscopy -- IV. Absorption Changes Induced by Incoherent Occupations -- V. Applications to Four-Wave-Mixing Spectroscopy -- VI. Summary -- VII. Outlook -- References -- Chapter 7. Electronic and Structural Response of Materials to Fast, Intense Laser Pulses -- I. Introduction -- II. Tight-Binding Electron-Ion Dynamics -- III. ε (ω ) and χ(2) as Signatures of a Nonthermal Phase Transition -- IV. Detailed Information from Microscopic Simulations -- V. Formula for the Second-Order Susceptibility χ(2) -- VI. Response of Si to Fast, Intense Pulses -- VII. Density Functional Simulation for Si -- VIII. Response of C60 to Ultrafast Pulses of Low, High, and Very High Intensity -- IX. The Simplest System, H2+ -- X. Biological Molecules -- XI. Conclusion -- References -- Chapter 8. Coherent THz Emission in Semiconductors -- I. Introduction -- II. Principles of Pulsed THz Emission and Detection -- III. Macroscopic Currents and Polarizations -- IV. Coherent Charge Oscillations -- V. THz Emission from Quantum Structures -- VI. Applications in Semiconductor Spectroscopy -- VII. Conclusions -- References -- Index -- Contents of Volumes in This Series.

Note: Cover -- Inside front cover -- Contents -- Preface -- 1 Vector Analysis -- 2 Vector Analysis in Curved Coordinates and Tensors -- 3 Determinants and Matrices -- 4 Group Theory -- 5 Infinite Series -- 6 Functions of a Complex Variable I: Analytic Properties Mapping -- 7 Functions of a Complex Variable II: Calculus of Residues -- 8 Differential Equations -- 9 Sturm-Liouville Theory-Orthogonal Functions -- 10 The Gamma Function (Factorial Function) -- 11 Legendre Polynomials and Spherical Harmonics -- 12 Bessel Functions -- 13 Hermitie and Laguerre Polynomials -- 14 Fourier Series -- 15 Integral Transforms -- 16 Partial Differential Equations -- 17 Probability -- 18 Calculus of Variations -- 19 Nonlinear Methods and Chaos -- Appendix 1 Real Zeros of a Function -- Index -- Inside back cover.

Note: Förderkennzeichen BMBF 08NM106E [alt] - 01NM106E. - Verbund-Nr. 01019978. - Engl. Zsfassung u.d.T.: Combine project "New Economy" - partial project Ruhr-University of Bochum , Unterschiede zwischen dem gedruckten Dokument und der elektronischen Ressource können nicht ausgeschlossen werden , Auch als gedr. Ausg. vorhanden , Systemvoraussetzungen: Acrobat reader.