In:
Journal of Physics: Conference Series, IOP Publishing, Vol. 2368, No. 1 ( 2022-11-01), p. 012014-
Kurzfassung:
Nowadays, the yield rate of semiconductor process is strongly affected even by nanoscale defects on bare Si wafer surfaces. Therefore, a non-destructive and high-speed method for detection of nanoparticle contamination is highly demanded. In this research, a nanoparticle detection method is proposed based on the fact that the volatilization process of the volatile inert liquid behaves as an autonomous nanoparticle search probe. Dynamic phase contrast microscopy (Dynamic PCM) is proposed to detect small thickness changes of a thin liquid film with high sensitivity. The dynamic PCM is expected to have double sensitivity compared to normal PCM and it is experimentally verified. Based on previous results, 4% intensity change is expected for 10 nm particles and even over 1.5% intensity change is expected for 5 nm particles by using this proposed dynamic PCM.
Materialart:
Online-Ressource
ISSN:
1742-6588
,
1742-6596
DOI:
10.1088/1742-6596/2368/1/012014
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
2022
ZDB Id:
2166409-2
Permalink