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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 3886-3894 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Si and Ge layers have been grown on CaF2/Si(111) by molecular-beam epitaxy. Both Ge and Si grow as islands, and both the island size and the spacing between nucleation sites are considerably larger for Ge (∼300 nm) than for Si (∼100 nm). In addition, Ge and Si layers are found to be a mixture of type-A (aligned with the underlying CaF2) and type-B (rotated 180° about the surface normal with respect to the underlying CaF2) regions. The crystalline quality and surface morphology of the Ge layers are much better than those of the Si layers. This is thought to be due to the larger island size of the Ge deposits and to a greater ease of movement of the boundaries between type-A and type-B regions in Ge. Hall measurements show electron mobilities of up to 664 cm2/V s in Si layers and hole mobilities of 234 cm2/V s for Ge layers. Finally, the use of a GexSi1−x-Si superlattice, when grown on a GexSi1−x buffer layer which is lattice matched to the CaF2 at the growth temperature, is shown to improve Si heteroepitaxy.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 2738-2741 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured the optical constants of epitaxial films of CoSi2 and NiSi2, grown by molecular beam epitaxy on Si(111), in the energy range of 0.9–4.0 eV. The behavior of the optical constants is characteristic of metals: Drudelike in the low energy region and deviating from Drude behavior as interband transitions set in. Interband transitions are found to have already set in at 1 eV. The absorption varies significantly with energy, which has implications for photoresponse studies of internal photoemission in these material systems.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 4218-4222 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Transverse acoustoelectric voltage (TAV) measurements have been analyzed as a function of incident photon energy, dc bias voltage, temperature, and surface acoustic wave (SAW) frequency of GaAs layer (∼1.4 μm thick) grown on a vicinal Si(100) substrate by molecular-beam epitaxy. The TAV technique is used to show that the band gap and impurity level transitions are of slightly lower energies, compared to the bulk GaAs. This might be due to the residual strain changes in the band structure of GaAs grown on Si. It is also noticed that the presence of an interface considerably changes the shape of the experimental TAV versus bias voltage at low temperatures. Drastic variations of TAV as a function of SAW frequency and temperature are also observed. The cause of variations is not yet clear, but possible explanations are discussed.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 2156-2162 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Motivated by the recently developed experimental capability of ballistic-electron-emission microscopy (BEEM), we study the effect of phonon scattering and quantum mechanical reflection on the ballistic transport across the Schottky barrier from the metal into the semiconductor. We argue that, for the Schottky barrier formed by a metal overlayer on a semiconductor substrate, one can typically expect the quantum mechanical transmission probability to have an E1/2 dependence, where E is the electron kinetic energy in the final state. We make a distinction between the metallurgical metal/semiconductor interface and the Schottky barrier energy maximum resulting from image potential, and calculate the optical phonon scattering rate between the interface and the maximum. We compute the combined effect of optical phonon scattering and quantum mechanical scattering on the ballistic transport for an initially isotropic velocity distribution of electrons in the metal, and we show that the two scattering processes combine to give a much weaker energy dependence than for either effect alone for cases of the Au/Si and Au/GaAs at both 300 K and 77 K. We use our model to show that the magnitude of the BEEM current for Au/Si should be roughly 5 times larger than for Au/GaAs and that decreasing the temperature from 300 K to 77 K should increase the magnitude of the BEEM current for Au/GaAs by a factor of about 3. There is fairly good agreement between our predictions and the available experimental evidence.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 5601-5605 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have measured the optical properties of epitaxial CoSi2 films on Si from 0.062 to 2.76 eV by ellipsometry and spectrophotometry. The energy dependencies of the dielectric constants show Drude behavior at energies lower than ∼0.2 eV with Drude parameters (h-dash-bar)ωp=(5.8±0.2) eV and (h-dash-bar)/τ=(0.09±0.02) eV. Using the measured optical constants, the CoSi2 film is shown to have maximum absorptance at a thickness of ∼20 nm for λ(approximately-greater-than)1.4 μm. Finally, we have calculated the absorptance of a composite film of CoSi2 particles embedded in Si and found that the absorptance peak due to a surface plasmon resonance in the CoSi2 particles shifts to higher energy as the ellipsoidal particles become more elongated, in agreement with recent observations by Fathauer et al. [Phys. Rev. B 44, 1345 (1991)].
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 419-421 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: By using the pulsed laser deposition technique, high-temperature superconducting YBa2Cu3O7−x (YBCO) films were grown on Si(001) with a 36 nm single-crystal 〈001〉 oriented CoSi2 buffer layer. The films, grown at a substrate temperature of ∼700 °C, have a metallic resistive temperature dependence with zero resistance at 85 K. X-ray diffraction, scanning electron microscopy, and ion channeling studies show that the YBCO films are polycrystalline but are strongly c-axis oriented normal to the Si substrate. Diffusion at the interface between the YBCO film and silicide buffer layer was minimized. This is essential to the growth of high-temperature superconducting films on Si substrates.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 4853-4856 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial films of cobalt silicide grown on (001) Si by molecular beam epitaxy have been characterized by transmission electron microscopy. Apart from (001) oriented CoSi2 grains, regions of 〈221〉 type orientations were also found. The 〈221〉 oriented domains were found to be associated with pronounced facetted depressions on the (001) Si surface. Empirical observations suggest that the formation of 〈221〉 CoSi2 domains and the formation of other types of silicide stoichiometries may be related. It is demonstrated that these microstructural instabilities may be suppressed by the codeposition of cobalt and silicon rather than simply by depositing cobalt and reacting with the Si substrate to produce (001) CoSi2.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 58 (1985), S. 302-308 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: CaF2 films have been grown epitaxially on (100) and (111) Si substrates by molecular beam epitaxy. These films have been characterized by electron microscopy, reflection high-energy electron diffraction, Rutherford backscattering ion channeling, and back-reflection Laue x-ray diffraction. In addition, chemical etching has been used to reveal dislocations and to delineate cracks. Film cracking appears to be related to crystalline perfection through misfit dislocation mobility. It is possible to grow high quality, (xmin=3.0%) single-crystal films on (111) Si which are free of cracks and atomically flat. However, the high free energy of the (100) surface in an ionic fluorite crystal prevents the growth of comparable CaF2 films on the (100) Si surface.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 65 (1989), S. 4903-4907 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A method for computing the quantum mechanical transmission probability (QMTP) from plane interfaces is presented. The method uses the electronic band structure of the material and the independent-electron approximation, and consists of a proper reduction of the three-dimensional problem to a one-dimensional problem, using a generalized form of the WKB wave functions, and matching the wave functions at the interface to preserve the continuity of a generalized probability current and density. The method was used to compute the QMTP at the interface of a simple metal and the Si(100) and Si(111) surface for ballistic electrons traveling normal to the interface at the Schottky image barrier maximum. The result shows that the crystal orientation and the location of the band minimum affect the QMTP.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 51 (1987), S. 1176-1178 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have used the x-ray standing-wave technique and bulk x-ray diffraction to investigate the structural properties of thin CoSi2 layers grown epitaxially on Si(111). The perpendicular lattice mismatch with respect to the Si substrate was found to be −0.0152±0.0003 and −0.016±0.001 for 6-nm-thick and 16-nm-thick layers, respectively. The distance between Si(111) and the first Co layer was measured to be (0.288±0.005) nm and is thus stretched by (0.014±0.005) nm compared with a value determined by Si-like bulk bond length. The Co atoms are attached to the Si(111) dangling bonds in agreement with the model of fivefold coordinated metal atoms at the interface.
    Type of Medium: Electronic Resource
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