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  • 1
    Electronic Resource
    Electronic Resource
    Development of a hard x-ray imaging microscope : Proceedings of the 5th international conference on synchrotron radiation instrumentation (1995)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 2287-2289 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A hard x-ray imaging microscope based on a phase zone plate has been developed and tested. The zone plate, with a 5 cm focal length and a 0.2 μm smallest linewidth, was used to image 8 keV x rays from the samples. The imaging microscope can be used to obtain nearly diffraction-limited resolution over the entire imaging field, and its resolution is almost independent of source size and source motions. We have tested such an imaging microscope, and a resolution of about 0.4 μm was obtained. The images were obtained with an exposure time of less than 1 min, for a magnification factor of 30 in the x rays. The x rays were then converted into visible light, and another 7 times magnification were obtained by using a lens system coupled to a charge coupled device camera. The results from the imaging microscope, and possible applications, will be discussed. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1145666
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  • 2
    Electronic Resource
    Electronic Resource
    Hard x-ray phase zone plate fabricated by lithographic techniques (1992)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 61 (1992), S. 1877-1879 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A Fresnel phase zone plate with an unprecedented focusing efficiency of 33% was fabricated using an x-ray lithographic technique and was tested using synchrotron x rays. Contributions by the zeroth-order x ray to the focus were minimal. Spatial resolution in the micrometer range was achieved. The measured spot size was dominated by geometric demagnification of the source. It should be possible to obtain submicrometer resolution by aperturing the source. Experimental results of focusing efficiency measurements, intensity distribution at the focal plane, and spatial resolution tests are reported.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.108400
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  • 3
    Electronic Resource
    Electronic Resource
    STM characterization of InP gratings for DFB laser fabrication (1994)
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 22 (1994), S. 296-299 
    Details
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Diffraction gratings for distributed feedback (DFB) laser devices were characterized by means of a scanning tunnelling microscope (STM) operating in air. The gratings, made of n-doped InP semiconductor, were prepared using holographic and electron beam lithography (EBL) exposures followed by reactive ion etching (RIE) to transfer the photoresist pattern into the wafer. The grating surfaces were partly shadow-coated with a thin gold layer, and the line patterns were STM-imaged on both the coated and non-coated InP surfaces. Pitches of first- and second-order gratings, including λ/4 phase shift lines and the depth of the holographic second-order grating, were measured by means of a precisely calibrated piezo-capacitive STM head, a UV diffractometer and a scanning electron microscope (SEM). A precise STM characterization of the coated line patterns was achieved. As regards the non-coated surfaces, reliable STM measurements of InP grating pitches were performed without any sample preparation and surface contamination.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/sia.740220164
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