In:
Journal of Applied Physics, AIP Publishing, Vol. 87, No. 9 ( 2000-05-01), p. 6490-6492
Abstract:
We have used ballistic electron magnetic microscopy to image, with nanometer resolution, the magnetization behavior of Co/Cu/Co trilayer films in the presence of a magnetic field. Films prepared both by thermal evaporation and by magnetron sputtering have been studied. In each case we have observed both large, ∼500 nm, domain structures, and much smaller, apparently randomly dispersed, regions of magnetic misalignment between the Co layers that persist to fields & gt;100 Oe. We find the details of the ballistic electron transport through the films to be different on small length scales, ∼50 nm, for the two types of growth methods.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
2000
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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