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  • 1990-1994  (3)
  • 1991  (3)
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  • 1990-1994  (3)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 3088-3092 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The thermal stability of a-Si/a-Ge superlattices with periods ranging from 2.5 to 41.2 nm has been studied using Raman spectroscopy. Atomic relaxation and rearrangement at the Si/Ge interfaces occur up to an anneal temperature of 300 °C. Further annealing of the superlattices reveals enhanced diffusion and a retarded crystallization, and these effects are more pronounced in short period superlattices.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 508-510 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Raman scattering from folded acoustic modes of amorphous Si/Ge superlattices has been employed to study thermally induced structural changes in samples of different periods. For a superlattice with 13.5-nm period, the position and intensity of the folded phonon doublet, obtained as a function of annealing temperature, reveal (i) the diffusion of Si into the Ge layers up to an anneal temperature of 500 °C without much effect on Si/Ge interfaces, (ii) a severe degradation of Si/Ge interfaces at an anneal temperature of 600 °C, followed by crystallization of the superlattice, and (iii) a nearly complete intermixing of the layers after the 700 °C anneal. A superlattice with a larger period (P=20.5 nm), on the other hand, retains its layered structure even after an anneal of 700 °C.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 1836-1838 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Unhydrogenated diamond-like carbon films were prepared at room temperature by a simple dc plasma chemical vapor deposition system with a low overall power consumption. A gaseous mixture of methane and argon (1:9) was used as a material gas with the intent of bombarding the growing film with Ar+ ions. The bombardment of the depositing species with Ar+ ions present in the plasma leads to (i) removal of hydrogen from the carbon atoms and (ii) a preferential resputtering of weakly bonded graphite precursors from the film surface giving rise to diamond-like properties of the films. The progressive thermal annealing of the films induces graphitization, and promotes growth of the crystallites at higher anneal temperatures (≥500 °C)
    Type of Medium: Electronic Resource
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