Digitale Medien
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
81 (1997), S. 1604-1605
ISSN:
1089-7550
Quelle:
AIP Digital Archive
Thema:
Physik
Notizen:
Electromigration threshold, the product of current density, j, and the threshold length, lth, was measured for unencapsulated thin-film Cu conductors using edge-displacement techniques. jlth was measured between 175 and 275 °C, and was found to be temperature dependent above 200 °C where jlth decreased with increasing temperature. It is suggested that the temperature dependence of the electromigration threshold may be obtained by considering the effects of the changing deformation mechanisms with changing temperature. © 1997 American Institute of Physics.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.363894
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