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    Publication Date: 2011-07-09
    Description: Author(s): D H K Murthy, T Xu, W H Chen, A J Houtepen, T J Savenije, L D A Siebbeles, J P Nys, C Krzeminski, B Grandidier, D Stievenard, P Pareige, F Jomard, G Patriarche and O I Lebedev Affiliation(s): Optoelectronic Materials Section, Department of Chemical Engineering, Delft University of Technology, 2628 BL Delft, The Netherlands; Dutch Polymer Institute (DPI), PO Box 902, 5600 AX Eindhoven, The Netherlands; Institut d'Electronique, de Microelectronique et de Nanotechnologie, IEMN, (CNRS, UMR 8520), Departement ISEN, 41 bd Vauban, 59046 Lille Cedex, France; Groupe de Physique des Materiaux, Universite et INSA de Rouen, UMR CNRS 6634, Avenue de l'universite, BP 12, 76801 Saint Etienne du Rouvray, France; GEMAC, Universite de Versailles-Saint-Quentin, UMR CNRS 8535, 1 place Aristide Briand, 92125 Meudon, France; CNRS-Laboratoire de Photonique et de Nanostructures (LPN), Route de Nozay, 91460 Marcoussis, France; Laboratoire CRISMAT. UMR 6508, CNRS-ENSICAEN, Universite de Caen, 6Bd Marechal Juin 14050 Caen, France
    Print ISSN: 0957-4484
    Electronic ISSN: 1361-6528
    Topics: Physics
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