Publikationsdatum:
2014-12-13
Beschreibung:
Publication date: February 2015 Source: Vacuum, Volume 112 Author(s): Haitao Li , Qiang Wang , Minghui Zhuang , Junjie Wu TiN/TiCN films were prepared on AZ31 by physical vapor deposition. Structural features and residual stress were determined by X-ray fluorescence (XRF), scanning electron microscopy (SEM) and based on the grazing incidence X-ray diffraction (GIXRD), respectively. Results show that films have (111) preferred orientation. With a increasing of the reaction gas ratio, the C + N and Ti content increases first then decreases, and reach at the maximum value when the gas ratio is 15/5/3. Film have uniform thickness, and the hole shape defects appears in partial film and non-uniformly distribute on the surface of the film. The residual stress was tensile stress, and the residual tensile stress value decreased with the increase of the reaction gas ratio.
Print ISSN:
0042-207X
Digitale ISSN:
1879-2715
Thema:
Maschinenbau
,
Physik
