In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 52, No. 7R ( 2013-07-01), p. 071301-
Abstract:
The absolute density of the first excited state atomic hydrogen H( n =2) in an Ar/H 2 mixture is measured in-situ by cavity ring-down spectroscopy under mesoplasma condition. The H( n =2) atom density is determined to be in the range of 10 10 –10 11 cm -3 and the formation of H( n =2) having such high density is identified to be predominantly due to the associative charge exchange/dissociative recombination reactions, similar to dc-arc plasma expanding into a low-pressure vessel that have been previously reported. The local H( n =2) atom density is found to have a linear variation with deposition rate, which indicates that high H( n =2) atom density have a direct role in the reduction of SiHCl 3 to Si.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAP.52.071301
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2013
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
