In:
Solid State Phenomena, Trans Tech Publications, Ltd., Vol. 124-126 ( 2007-6), p. 867-870
Abstract:
Ni(60Å)/Cu film possessing perpendicular magnetic anisotropy (PMA) changes its easy
direction into the plane by ion irradiation, due to the relaxation of the strain. By fixing our eyes upon this magnetic property, the magnetic patterning of Ni(60Å)/Cu film using 40 keV O ion irradiation
was performed through the photo-resist (PR) mask having 10㎛ x 10 ㎛pattern sizes to pattern the magnetic film. After the PR mask removal of an irradiated film, the magnetic properties were
investigated by the magneto-optic Kerr effect and the formation of magnetic pattern was observed by the magnetic force microscopy. The PMA magnetic patterning of epitaxial Ni/Cu film was
successfully performed in scale of ㎛ by using ion irradiation, compatible with device process.
Type of Medium:
Online Resource
ISSN:
1662-9779
DOI:
10.4028/www.scientific.net/SSP.124-126
DOI:
10.4028/www.scientific.net/SSP.124-126.867
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2007
detail.hit.zdb_id:
2051138-3