In:
Key Engineering Materials, Trans Tech Publications, Ltd., Vol. 373-374 ( 2008-3), p. 497-500
Abstract:
Surface modification mechanism on scratch of ion implanted p-Si (100) is investigated by
scanning electric microscopy and micro-Raman spectroscopy. Raman experimental results reveal that the amorphous Si appears near the scratch during the scratching process, while the ion implantation
adjusts the structural parameters of the amorphous Si and changes the residual stress state of the surface scratch from tension to compression. Moreover, Raman experimental results reveal that the
laser power synchronously decreases Raman shift and full width of half maximum intensity (FWHM). The laser heating effect can be neglected because a lower laser power is selected in our measurements.
Type of Medium:
Online Resource
ISSN:
1662-9795
DOI:
10.4028/www.scientific.net/KEM.373-374
DOI:
10.4028/www.scientific.net/KEM.373-374.497
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2008
detail.hit.zdb_id:
2073306-9