In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 12R ( 1997-12-01), p. 7354-
Abstract:
The dependence curve of the resonance frequency shift of a dynamic mode atomic force microscope (AFM) cantilever on the distance between the tip and the sample is examined. For a system with clean semiconductor sample and a metal-coated tip, the obtained curve exhibited a larger frequency shift compared to one with a uncoated Si tip, and an increasing deviation from van der Waals characteristics as the separation decreased. This is due to an additional attractive force which becomes dominant at a small separation. This force is considered to play a crucial role in high-resolution imaging of semiconductor surfaces with a dynamic mode AFM.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.7354
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7