In:
International Journal of Modern Physics B, World Scientific Pub Co Pte Ltd, Vol. 20, No. 25n27 ( 2006-10-30), p. 3757-3762
Abstract:
Radio frequency microelectromechanical systems (RF–MEMS) are an attractive solution for wireless telecommunication applications. Freestanding films play an important role in RF–MEMS devices. For the successful commercialization of RF–MEMS devices, however, it is necessary to evaluate the mechanical reliability of freestanding films. The first step in the evaluation is to characterize the mechanical behavior of the films. This study focuses on freestanding Mo thin films. Mo test structures with a thickness of 960 nm were fabricated using sputtering deposition and patterned using a surface and bulk micromachining process. The strip-bending test was used to measure the stress–strain relation of the freestanding Mo thin films. The measured elastic modulus, initial stress, and yield strength of Mo thin films are reported.
Type of Medium:
Online Resource
ISSN:
0217-9792
,
1793-6578
DOI:
10.1142/S0217979206040325
Language:
English
Publisher:
World Scientific Pub Co Pte Ltd
Publication Date:
2006
detail.hit.zdb_id:
2086681-1
detail.hit.zdb_id:
246716-1
