In:
Physics of Plasmas, AIP Publishing, Vol. 5, No. 5 ( 1998-05-01), p. 1541-1544
Abstract:
Diamond films were deposited by hot cathode direct current discharge plasma chemical vapor deposition from a CH4–H2 gas mixture. Optical emission spectroscopy was employed to investigate in situ the plasma emission characterization during diamond synthesis. The dependence of plasma emission spectra on the input CH4/H2 ratio and the substrate temperature was investigated. A significant variation in the emission intensity of the CH radical was measured with a change in the CH4 concentration. C2 was detected only at high CH4 concentration. In addition, the relative emission intensity of the C2 species was sensitive to a high substrate temperature. The correlation between the spectra of some species and the quality of diamond films was studied. These results suggest that CH and CH+ are all important precursor species in the diamond deposition reaction, while C2 is associated with the presence of a nondiamond phase in the films.
Type of Medium:
Online Resource
ISSN:
1070-664X
,
1089-7674
Language:
English
Publisher:
AIP Publishing
Publication Date:
1998
detail.hit.zdb_id:
1472746-8
