Molecular Beam Epitaxy of Wurtzite GaN-Based Magnetic Alloy Semiconductors

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Copyright (c) 2001 The Japan Society of Applied Physics
, , Citation Seiji Kuwabara Seiji Kuwabara et al 2001 Jpn. J. Appl. Phys. 40 L724 DOI 10.1143/JJAP.40.L724

1347-4065/40/7B/L724

Abstract

The preparation of hexagonal GaN:Mn and GaN:Fe epilayers has been studied by RF-plasma-assisted molecular beam epitaxy. GaN:Fe epilayers exhibit superparamagnetic behavior, presumably due to ferromagnetic inclusions. GaN:Mn epilayers can be expressed in the form of Ga1-xMnxN with x up to 0.02, indicating the successful preparation of the GaN-based magnetic alloy semiconductor for the first time. The epilayers are primarily paramagnetic and highly resistive. For epilayers with very high Mn concentration (∼ 1021 cm-3), analysis of the paramagnetic component has revealed the effective spin number S ≈2.5 together with the positive paramagnetic Curie temperature. This suggests the presence of ferromagnetic spin exchange between Mn ions.

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10.1143/JJAP.40.L724