Abstract
A decaborane-based boronization system has been installed in the JT-60U tokamak in order to reduce the influx of impurities during plasma discharges. Boronization has been performed under a glow discharge using a helium-decaborane gas mixture. The properties of the boron films deposited through boronization and the effects of boronization on the tokamak discharges were investigated. It was found that the deposition of a boron layer with high purity was achieved with few impurities other than hydrogen through boronization, and that the present boronization deposited toroidally nonuniform boron film. It was also found that the decaborane-based boronization resulted in good plasma performance similar to that of conventional boronization.