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Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin

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Abstract

Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and fluorescence microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable, well-defined micropatterns with a nanoscale thickness.

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Acknowledgements

The authors are grateful to the National Natural Science Foundation of China for financial support of this work (Grant No: 20335010).

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Authors and Affiliations

  1. The Key Lab of Bioorganic Chemistry and Molecular Engineering of Ministry of Education, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, People’s Republic of China

    Bing Yu, Hai–Lin Cong, Hu–Wei Liu, Cong-Hua Lu, Fang Wei & Wei-Xiao Cao

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  1. Bing Yu
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  2. Hai–Lin Cong
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  3. Hu–Wei Liu
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Correspondence to Hu–Wei Liu.

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Yu, B., Cong, H., Liu, H. et al. Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin. Anal Bioanal Chem 384, 385–390 (2006). https://doi.org/10.1007/s00216-005-0229-9

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