Abstract
Stable, ultrathin DNA micropatterns were fabricated from photosensitive polymer diazoresin (DR) through a self-assembly technique. The micropatterns were achieved on LBL ultrathin film after UV exposure through a photomask. The patterns were characterized systematically with scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and fluorescence microscopy. All of the results indicate that the combined LBL self-assembly and photolithography technique is a promising method for constructing stable, well-defined micropatterns with a nanoscale thickness.
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The authors are grateful to the National Natural Science Foundation of China for financial support of this work (Grant No: 20335010).
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Yu, B., Cong, H., Liu, H. et al. Fabrication and characterization of stable ultrathin film micropatterns containing DNA and photosensitive polymer diazoresin. Anal Bioanal Chem 384, 385–390 (2006). https://doi.org/10.1007/s00216-005-0229-9
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DOI: https://doi.org/10.1007/s00216-005-0229-9