Note: Front Cover -- Laser Ablation -- Copyright Page -- Table of Contents -- Preface -- Conference organization -- Sponsors -- Chapter 1. Microscopic and mesoscopic aspects of laser-induced desorption and ablation -- Abstract -- 1. Introduction and motivation -- 2. Microscopic and mesoscopic scaling in laser-surface interactions -- 3. Bond-orbital theory at the microscale and mesoscale -- 4. Desorption, from optical absorption to lattice instability -- 5. Scaling properties of laser ablation thresholds -- 6. Summary and conclusions -- Acknowledgements -- References -- Chapter 2. Modeling of dynamical processes in laser ablation -- Abstract -- 1. Introduction -- 2. Laser-target interactions -- 3. Plume formation -- 4. Plume transport -- 5. Plume-substrate interactions -- 6. Summary -- Acknowledgements -- References -- Chapter 3. An analytical model for three-dimensional laser plume expansion into vacuum in hydrodynamic regime -- Abstract -- 1. Introduction -- 2. Model -- 3. Numerical integration. Flip-over-effect -- 4. Time-of-flight spectra -- 5. Expansion of vapor cloud into an ambient gas -- 6. Film thickness profile -- Acknowledgements -- References -- Chapter 4. Hydrodynamic phenomena during laser irradiation: a finite difference approach -- Abstract -- 1. Introduction -- 2. Model -- 3. Results and discussion -- Acknowledgements -- References -- Chapter 5. Material removal and plasmadynamics during pulsed laser deposition by excimer and CO2 laser radiation -- Abstract -- 1. Introduction -- 2. The LIV process -- 3. Plasmadynamics -- 4. Results and discussion -- 5. Conclusion -- References -- Chapter 6. Laser-solid interaction and dynamics of laser-ablated materials -- Abstract -- 1. Introduction -- 2. Laser-solid interaction -- 3. Dynamic source effect -- 4. Plume dynamics in background gas -- 5. Summary -- References. , Chapter 7. Analytical description of the film thickness distribution obtained by the pulsed laser ablation of a monoatomic target: application to silicon and germanium -- Abstract -- 1. Introduction -- 2. Analytical description of the adiabatic plasma expansion -- 3. Comparison with the experiments -- 4. Conclusion -- References -- Chapter 8. An analytical model for the laser ablation of materials -- Abstract -- 1. Introduction -- 2. The computational model -- 3. Results -- References -- Chapter 9. Calculations and experiments of material removal and kinetic energy during pulsed laser ablation of metals -- Abstract -- 1. Introduction -- 2. Model calculations -- 3. Experimental procedures -- 4. Results -- 5. Conclusions -- References -- Chapter 10. Measurement and calculation of the Fe2O3 ablation depth -- Abstract -- 1. Introduction -- 2. Experiment -- 3. Determination of the Fe2O3 threshold fluence by a resonant photo-ablation mechanism -- 4. Calculation of the Fe2O3 laser ablation depth -- References -- Chapter 11. Calculation and measurement of the ultrasonic signals generated by ablating material with a Q-switched pulse laser -- Abstract -- 1. Introduction -- 2. Theoretical modelling -- 3. Experimental results and comparison with theory -- 4. Summary and conclusion -- References -- Chapter 12. 2D modeling of laser-induced plume expansion near the plasma ignition threshold -- Abstract -- 1. Introduction -- 2. Governing equations and numerical method -- 3. Computational domain, boundary and initial conditions -- 4. Results and discussion -- 5. Conclusion -- References -- Chapter 13. The influence of the electron structure of atoms shells on characteristics of optical breakdown in metal vapour -- Abstract -- 1. Introduction -- 2. Mathematical model -- 3. Analysis of the results -- 4. Conclusions -- References. , Chapter 14. 2D-simulation of the system: laser beam + laser plasma + target -- Abstract -- 1. Introduction -- 2. Formulation of the problem -- 3. Analysis of the results -- 4. Conclusion -- References -- Chapter 15. Modeling of laser induced plasma, spectroscopic and time of flight experiments in pulsed laser deposition -- Abstract -- 1. Introduction -- 2. The model -- 3. Time-of-flight results -- 4. Optical emission spectroscopy -- 5. Conclusion -- References -- Chapter 16. Spatial distribution of laser-ablated material by probing a plasma plume in three dimensions -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Discussion -- 5. Conclusions -- Appendix A. Putting Eqs. (2) in unitless form -- References -- Chapter 17. Electrostatic probe and optical spectroscopy studies of low temperature laser produced plasmas -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 18. Study of the expansion of the laser ablation plume above a boron nitride target -- Abstract -- 1. Introduction -- 2. Experimental setup -- 3. Experimental investigations in the plume -- 4. Conclusion -- References -- Chapter 19. Plasma parameters in pulsed laser-plasma deposition of thin films -- Abstract -- 1. Introduction -- 2. Experimental technique -- 3. Measurements -- 4. Summary -- Acknowledgements -- References -- Chapter 20. Preferential vaporization and plasma shielding during nano-second laser ablation -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Experimental results -- 4. Thermal evaporation model -- Acknowledgements -- References -- Chapter 21. Laser ablation plume thermalization dynamics in background gases: combined imaging, optical absorption and emission spectroscopy, and ion probe measurements -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Results. , 4. Conclusions -- Acknowledgements -- References -- Chapter 22. Electromagnetic diagnostics during pulsed laser deposition -- Abstract -- 1. Introduction -- 2. Experimental set up -- 3. Experimental results -- 4. Discussion -- 5. Conclusions -- References -- Chapter 23. Fundamental characteristics of laser-material interactions (ablation) in noble gases at atmospheric pressure using inductively coupled plasma-atomic emission spectroscopy -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Roll-off -- 4. Inert gas dependence -- 5. Conclusion -- Acknowledgements -- References -- Chapter 24. Monitoring stress power during high-power pulsed laser-material interactions -- Abstract -- 1. Introduction -- 2. Theory -- 3. Experimental -- 4. Results and discussion -- References -- Chapter 25. Simultaneous monitoring of ablative shocks in air by high-speed cineholography and multiple-pass beam deflection probe -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References -- Chapter 26. Transport of neutral atoms, monoxides and clusters in the plume produced by laser ablation of YBa2Cu3O7-X in oxygen environment -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- Acknowledgements -- References -- Chapter 27. Temperature measurements during laser ablation of Si into He, Ar and O2 -- Abstract -- 1. Introduction -- 2. Experimental setup -- 3. Results and Discussions -- 4. Conclusion -- References -- Chapter 28. Spatially and temporally resolved emission intensities and number densities in low temperature laser-induced plasmas in vacuum and in ambient gases -- Abstract -- 1. Introduction -- 2. Experiment -- 3. Results and discussion -- 4. Conclusion -- Acknowledgements -- References. , Chapter 29. Laser produced plasmas in high fluence ablation of metallic surfaces probed by time-of-flight mass spectrometry -- Abstract -- 1. Introduction -- 2. Experimental procedure -- 3. Results and discussion -- 4. Conclusions -- Acknowledgements -- References -- Chapter 30. Optical diagnostics of the laser-target and laser-plume interaction in pulsed laser ablation -- Abstract -- 1. Introduction -- 2. Experimental procedure -- 3. Reflectivity measurements -- 4. Optical emission spectra -- 5. Conclusions -- References -- Chapter 31. Time-of-flight characterization of laser ablation plume from NbTe2 target in He atmosphere -- Abstract -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusion -- References -- Chapter 32. Investigation of vaporization and condensation processes of thin layers of CdHgTe from laser erosion plasma in Hg atmosphere -- Abstract -- 1. Introduction -- 2. Experimental technique -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 33. Density and electron temperature of laser induced plasma - a comparison of different investigation methods -- Abstract -- 1. Introduction -- 2. Laser parameter -- 3. Electron temperature -- 4. Electron density -- 5. Discussion -- Acknowledgements -- References -- Chapter 34. Laser plasma threshold of metals -- Abstract -- 1. Introduction -- 2. Generation of acoustic waves -- 3. Experiment -- 4. Results and discussion -- 5. Conclusion -- References -- Chapter 35. Comments on explosive mechanisms of laser sputtering -- Abstract -- 1. Introduction -- 2. The explosive mechanisms -- 3. Numerical solution to evaluate the subsurface heating under conditions of normal vaporization -- 4. Importance of phase explosion -- 5. Conclusions -- Appendix A. (∂x/∂t)│x = 0 for long laser pulses -- Appendix B. The electron mean free path -- References. , Chapter 36. Analysis of the expansion of hydroxyapatite laser ablation plumes.

Note: Front Cover -- Surface Processing and Laser Assisted Chemistry -- Copyright Page -- Table of Contents -- Preface -- Conference organisation -- Supporting organisations and sponsors -- PART I: PRECURSORS FOR SURFACE PROCESSING -- Chapter 1. New metallo-organic precursors for surface processing -- 1. Introduction -- 2. Metal films -- 3. Metal oxide films -- 4. Metal nitride films -- 5. Metal fluoride films -- 6. Compound semiconductors -- 7. Conclusions -- References -- Chapter 2. Design and synthesis of CVD precursors to thin film ceramic materials -- 1. Introduction -- 2. Experimental section -- 3. Results and discussion -- Acknowledgments -- References -- Chapter 3. The photolytic laser chemical vapor deposition rate of platinum, its dependence on wavelength, precursor vapor pressure, light intensity, and laser beam diameter -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- Acknowledgements -- References -- Chapter 4. Photoprocesses in organometallics -- 1. Introduction -- 2. Metal alkyls -- References -- Chapter 5. Preferential (111) orientation of ZnSe on (100) GaAs deposited by laser-induced MOCVD -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Discussion -- 5. Conclusions -- References -- Chapter 6. The adsorption of triethylgallium on GaAs(100) at 300 K: adsorption kinetics from optical second harmonic generation transients -- 1. Introduction -- 2. Theory -- 3. Results and discussion -- 4. Conclusions -- Acknowledgements -- References -- Chapter 7. Photoreactions of adsorbed CH3Br on Pt(111) -- 1. Introduction -- 2. Experimental -- 4. Summary and conclusions -- Acknowledgements -- References -- Chapter 8. Second harmonic generation of C02-laser radiation and FTIR spectroscopy for resonant desorption in the adsorbate CO-NaCl(100) -- 1. Introduction. , 2. SHG of C02 laser radiation for resonant desorption -- 3. Experimental -- 4. CO on NaCl(100) - a model adsorbate for studying laser energy transfer -- 5. Results and discussion -- 6. Summary and conclusions -- Acknowledgements -- References -- PART II: DEPOSITION -- SECTION II-l: SUPERCONDUCTORS -- Chapter 9. High- Tc YBa2 Cu3 O7-8 prepared by chemical vapour deposition -- 1. Introduction -- 2. Experiments -- 3. Results -- 4. Conclusion -- Acknowledgements -- References -- Chapter 10. Deposition, characterization, and laser ablation patterning of YBCO thin films -- 1. Introduction -- 2. Experimental set-up -- 3. Film preparation -- 4. Film characteristics -- 5. Laser ablation lithography -- 6. Summary -- References -- Chapter 11. Computer-controlled ion beam deposition systems for high Tc superconductor and other multi-component oxide thin films and layered structures -- 1. Introduction -- 2. Description of the SBMT deposition system -- 3. Results -- 4. Conclusion -- Acknowledgement -- References -- Chapter 12. High quality YBa2Cu3Ox ultra-thin films and Y/Pr/Y multilayers made by a modified RF-magnetron sputtering technique -- 1. Introduction -- 2. Experimental -- 3. Results and discussions -- 4. Conclusions -- References -- Chapter 13. Characterization of the KrF laser-induced plasma plume created above an YBaCuO superconducting target and preparation of superconducting thin films -- 1. Introduction -- 2. Experimental set-up -- 3. Results and discussion -- 4. Conclusion -- Acknowledgment -- References -- Chapter 14. Laser-ablation deposition of uniform thin films of Bi2Sr2CaCu20x -- 1. Introduction -- 2. Mathematical analysis -- 3. Experimental studies -- 4. Conclusion -- Acknowledgements -- References -- Chapter 15. An investigation of laser ablation and deposition of Y-Ba-Cu-O in an oxygen environment -- 1. Introduction -- 2. Experimental. , 3. Results -- 4. Plume dynamics - analysis -- 5. Plume range -- 6. Deposition experiments -- 7. Conclusions -- Acknowledgements -- References -- SECTION I-2: METALS -- Chapter 16. Simulation of laser CVD -- 1. Introduction -- 2. Basic equations -- 3. Calculations, comparison with analytical expressions -- Acknowledgement -- References -- Chapter 17. Gas-phase transport and kinetics in pulsed-laser CVD -- 1. Introduction -- 2. Model -- 3. Discussion -- Acknowledgements -- References -- Chapter 18. High performance contact formation in LSI circuit restructuring using visible pulse laser induced ablation and CVD -- 1. Introduction -- 2. Experiment -- 3. Results -- 4. Summary -- References -- Chapter 19. Laser-assisted deposition for electronic packaging applications -- 1. Introduction -- 2. Factors influencing the LAD process -- 3. Effect of laser parameters -- 4. Prenucleation with palladium -- 5. Concentration of the precursor -- 6. Influence of the substrate material -- 7. Surface pretreatment -- 8. Applications -- References -- Chapter 20. Multichip packaging for very-high-speed digital systems -- Acknowledgment -- References -- Chapter 21. Optimization of the laser-induced deposition technique for its application in X-ray mask repair -- 1. Introduction -- 2. Experimental -- 3. Deposition processes -- 4. Experimental results -- 5. Repair results -- 6. Comparison with electron- and ion-induced deposition -- 7. Conclusion -- Acknowledgements -- References -- Chapter 22. HF formation in laser-induced CVD of tungsten -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Discussion -- 5. Conclusions -- Acknowledgements -- References -- Chapter 23. Laser direct writing of copper on various thin-film substrate materials -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Conclusion -- References. , Chapter 24. Direct writing of conducting traces by chemical modification of sohd coatings with laser radiation -- 1. Introduction -- 2. Experimental set-up -- 3. Results -- 4. Conclusions -- References -- Chapter 25. VUV synchrotron radiation processing of thin palladium acetate spin-on films for metallic surface patterning -- 1. Introduction -- 2. Experiment -- 3. Spectrometric study of chemical changes -- 4. Discussion -- 5. Conclusion -- Acknowledgments -- References -- Chapter 26. Investigation of the mechanism of the UV-induced palladium deposition process from thin solid palladium acetate films -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- References -- Chapter 27. Laser evaporation of metal sandwich layers for improved IC metallization -- 1. Introduction -- 2. Experimental set-up -- 3. Experimental results -- 4. Conclusion -- Acknowledgements -- References -- SECTION II-3: INSULATORS AND REFRACTORY MATERIALS -- Chapter 28. Filling of Si oxide into a deep trench using digital CVD method -- 1. Introduction -- 2. TMS/02 and TES /02 reaction systems -- 3. TES/H2 - O2 reaction system -- 4. Conclusion -- Acknowledgement -- References -- Chapter 29. Photo-assisted deposition of thin films on III-V semiconductors with UV and IR lamps -- 1. Introduction -- 2. Build-up of semiconductor/insulator interfaces in CVD and UVCVD -- 3. High-sensitivity infrared spectroscopy for the study of the InP/Si02 interface -- 4. Silicon nitride deposition by "flash" CVD -- 5. Deposition of semiconductors and metals -- 6. Conclusions -- Acknowledgments -- References -- Chapter 30. Si02 deposition by direct photolysis at 185 nm of N2O and SiH4 -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Modelling of the deposition mechanism -- Appendix A -- References. , Chapter 31. Deposition of Si02 by reactive excimer laser ablation from a SiO target -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusion -- References -- Chapter 32. Sol-gel low-temperature preparation of silica films: RBS, TEM and MOS C- V characterization -- 1. Introduction -- 2. Experimental procedure -- 3. High-resolution transmission electron microscopy -- 4. RBS analysis -- 5. MOS C-V analysis -- Acknowledgements -- References -- Chapter 33. Gas mixture dependence of the LCVD of Si02 films using an ArF laser -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Conclusions -- Acknowledgements -- References -- Chapter 34. Excimer laser deposition of silica films: a comparison between two methods -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Sample properties -- 5. Conclusions -- Acknowledgements -- References -- Chapter 35. Photochemical vapor deposition of titaniumdiboride -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusion -- Acknowledgment -- References -- Chapter 36. In situ formation of ionic carbide clusters by laser ablation -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- References -- Chapter 37. Synthesis of ultrafine Ti02 powders by a CW C02 laser -- 1. Introduction -- 2. Experimental -- 3. Results and discussion -- 4. Conclusions -- References -- SECTION II-4: SEMICONDUCTORS -- Chapter 38. On the role of the substrate position in the C02 laser CVD of amorphous hydrogenated silicon -- 1. Introduction -- 2. Experimental part -- 3. Results and discussion -- Acknowledgements -- References -- Chapter 39. Laser CVD of a-Si:H from SiH4 and Si2H6: relations between chemistry, growth rate and film properties -- 1. Introduction -- 2. Experimental -- 3. Results -- 4. Discussion -- Acknowledgements -- References. , Chapter 40. Picosecond YAG laser photoablation of amorphous silicon.