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  • 1
    Online Resource
    Online Resource
    Zurich :Trans Tech Publications, Limited,
    Keywords: Electronic books.
    Description / Table of Contents: Proceedings of the 3rd International Conference on Gettering and Defect Engineering in Semiconductor Technology (GADEST '89) held at Garzau, GDR, October 1989.
    Type of Medium: Online Resource
    Pages: 1 online resource (618 pages)
    Edition: 1st ed.
    ISBN: 9783035706444
    Series Statement: Solid State Phenomena Series ; v.Volumes 6-7
    Language: English
    Note: Intro -- Gettering and Defect Engineering in Semiconductor Technology -- Table of Contents -- Defect Engineering in VLSI-Technologies -- Gettering in Silicon by Oxygen Related Defects, Stacking Faults and Thin Polycrystalline Films -- Advances in the Understanding of Oxygen and Carbon in Silicon -- Investigations of the Structure, Formation, and Annihilation of Thermally Induced Donors in Silicon -- Effect of Volume Defects on Gold Gettering in CZ-SI -- Investigations of the Behaviour of Transition Metals in Silicon -- Defect Engineering for Bicmos-Technology -- Investigation of Gettering Phenomena in Semiconductors by Simultaneous Charge Collection Microscopy and Cathodoluminescence -- Implantation Induced Defect Modification in P Doped Bipolar Structures -- The Properties of the Defects in Heavy Implanted Silicon -- Defect Formation and Lateral Oxidation during Locos Processing -- Defects and Their Influence on Parasitic Devices in Integrated Circuits -- Volume Defect Formation in CZ SI Wafers and Related Electrical Effects -- Buried Layer Processing for Advanced Bipolar Technology -- Oxygen Precipitation in Silicon: Correlation of the Experimental Results Obtained with IR Spectroscopy, Preferential Etching and X-Ray Topography -- Gettering of Fast Diffusing Impurities by Radiation Defects in III-V Semiconductors -- On the Two-Step Nucleation in Internal Gettering for CMOS Fabrication Process -- Creation of Deep Denuded Zones in CZ Silicon Wafers -- Defect Engineering for ULSI Epitaxial Silicon -- Computer-Simulation of Gold-Redistribution in Silicon -- An Attempt to Simulate Oxygen Precipitation in Silicon -- Defect Formation in Dislocation-Free Silicon Containing Oxygen -- Influence of Preannealing on Oxygen Precipitation -- Silicon Intrinsic Gettering Durability and Effectiveness -- Effect of Heat Treatment on Defect Formation in Silicon. , Effects of Rapid Thermal Annealing Treatments on Electrical and Structural Properties of Silicon -- Defect Reactions in Semiconductors -- Electronic States in Plastically Deformed Silicon -- Defect Formation and Impurity Redistribution Due to the Electric Field and Elastic Stresses in Interface Regions -- Interaction of Point Defects with Interstitial Clusters, Dislocations and Impurities During in SITU Electron Irradiation of Silicon Crystals in the Electron Microscope -- Dependence of Phosphorus Transient Enhanced Diffusion on Depth Position of Extended Defects in Ion Implanted Silicon -- Impurity Gettering in Semicrystalline Silicon Solar Cells -- Formation and Defect Structure of Fe-B-Fe Complexes in Silicon -- Electrical Activity and Impurity Precipitation in Silicon Grain Boundaries -- Photo-Thermal Ionization Spectroscopy of Point Defects in Semiconductors -- Kink-Point Defect Interaction and Mobility of Dislocations in Semiconductors -- I. Conductivity Along Dislocations: Temperature Dependence and Nonlinear Effects II. Combined Resonance and Structure Peculiarities of Plastically Deformed Silicon -- Recrystallization and Defect Formation in Ion-Implanted Silicon Studied by Transmission Electron Microscopy -- Auger Recombination in Heavily-Doped p+ Silicon -- Photo-Capacitive Spectroscopy of Sulphur Atoms and Heat Treatment Defects in n-Si -- EPR Detection of Complex Platinum-Related Defects in Silicon -- Defect Kinetics and Impurity Diffusion During Hot Implants Into Silicon -- The Peculiarities of Deep Level Defect Passivation in SI by Atomic Hydrogen -- Dislocation Motion in Compound Semiconductors -- Dislocation Structures after Microdeformation of CaAs Single Crystals -- The Effect on the Schottky Barrier Height of Diffusion of Pt into Si From PtSi -- Electron Pulse Irradiation of Semiconductor Devices. , Charge Collection Microscopy in Gettering and Defect Engineering -- Lifetime in Silicon -- Scanning Infra-Red Microscope Investigation of Oxide Particles in Czochralski Silicon Heat-Treated for Intrinsic Gettering -- Laser Scanning Tomography: A Study of the Defect Cluster Nucleation and Growth in Silicon -- The Effect of Low-Energy Electron and Ion Beams on Properties of Near Surface Layers in Semiconductor Crystals -- The Capacitance Microscope: A Non-Contacting Stylus Technique for the Investigation of Semicionductor Surfaces -- Synchrotron Radiation X-Ray Studies on Strain in Semiconductor Crystals -- Positron Sudies of Thermal-Induced Defects in Silicon -- DLTS Investigations of the Carbon-Related Centers in Si -- The Noise Spectroscopy of Defects and Impurities in Compensated Silicon -- Determination of Generation Lifetime and Surface Generation Velocity by Sine-Voltage Sweep C-V Method -- Silicon Plates Homogeneity Diagnostics Method by Means of Semiconductor-Electrolyte Structure Surface Photovoltage Measurement -- Electrically Active Near-Surface Implantation Defects in Silicon and GaAs -- Trap-Spectroscopy in Insulating Layers -- Insulator Investigations in MIS Structures with Constant-Capacitance-DLTS Technique -- A Theoretical Model of the Surface Avalanche Method -- Application of High Tc Superconducting Thin Films in Microelectronics-Possibilities and Illusions -- Semiconductor Dynamic Memories -- Effect of Vibration Frequency and Sample Composition on Acoustic Properties of Y-Ba-Cu-O High-TC Superconductors -- SOI-Films by Zone Melting Recrystallization of Polycrystalline Silicon -- Heterogeneous Ion Synthesis of Isolating Layers in Si -- Spectroscopic Ellipsometry Studies of Silicon on Insulator Structures -- Silicon-on-Insulator Technology by Si-MBE. , Defect Microchemistry at the Si/SiO2 Interface Grown on Polycrystalline Silicon Sheets. Hydrogenation Effect Study -- Interfacial Defects Study of the Gallium Arsenide on Silicon Heterostructure -- Some Aspects of Interface and Surface Eingineering of AIII-BV-Compound-Semiconductors -- SOI by Silicon Dioxide Thermal Bonding -- Defect Engineering in SOI-Structures Formed by High Dose Implantation of Reactive Ions -- Strain and Critical Thickness of MBE Grown CaF2-Insulators on Si(111) -- Defect Control in Thick SOI-Films Produced by Zone Melting Recrystallization -- Defects and Their Influence on Parasitic Devices in Integrated Circuits -- Formation and Structure of Iron-Impurity Complexes in Silicon -- Defect Formation in Dislocation-Free Silicon Containing Oxygen -- Author Index.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3725-3728 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The article presents a study of the interaction of iron with a grain boundary in boron-doped multicrystalline silicon. The sample was intentionally contaminated with iron to a few 1014 cm−3 and investigated by the electron-beam-induced-current technique (measurement of minority-carrier diffusion length, quantitative imaging) in the temperature range 80–300 K. The measurements were carried out for two different states of iron in the sample: (i) iron paired with boron, i.e., as FeB, and (ii) iron as interstitial iron Fei. The differences between diffusion lengths for these two states were used to estimate the iron concentration. The analysis of the data revealed a pronounced iron profile around the grain boundary, indicating gettering of about 4×1011 iron atoms per cm2. The recombination velocity of the grain boundary is about 5×105 cm s−1 at 300 K and is not changed by the FeB destruction treatment. The temperature dependence of the iron-related diffusion length components is discussed and found to be in satisfactory agreement with what is expected from Shockley–Read–Hall theory. Further, the diffusion length analysis revealed also a strong recombination channel of unidentified origin. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The technique of electron-beam-induced current (EBIC) has been used to study the recombination activity of misfit dislocations in Si/SiGe epilayers. EBIC contrast measurements recorded as a function of temperature (T=80–300 K), c(T), were found to show a completely altered character following copper contamination of SiGe epilayers. In as-grown "clean'' material the dislocations were found to exhibit a very small contrast at low temperature only. For a Cu contamination of about 1 ppb the contrast increased markedly at low temperatures but remained invisible near room temperature. This c(T) behavior can be attributed to shallow trap levels at the dislocations. For a Cu contamination around 15 ppb the majority of dislocations exhibited contrast in the whole temperature range, being a consequence of near-midgap centers at the dislocation. Hydrogen plasma treatment of these dislocations was observed to passivate the contrast near room temperature but did not show a pronounced effect on the contrast at low temperatures, so that the very small dislocation contrast found for clean material was not restored by hydrogen. A Cu contamination treatment in the ppm range resulted in a dramatic increase of the contrasts in the whole temperature range. Investigations by transmission electron microscopy (TEM) revealed in that material copper precipitates connected with the misfit dislocations. In contrast to the low-contaminated material no direct decoration of the dislocations could be observed. TEM images revealed that the EBIC dislocation line contrast corresponded to bundles of up to 15 individual dislocations. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 911-913 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report first results on the recombination properties of structurally well defined NiSi2 precipitates in n-type silicon. Under the conditions applied, precipitates form without the occurrence of punched out dislocations or any other secondary defects. We find that the minority-carrier diffusion length (LD) measured by electron beam induced current (EBIC) is related to the precipitate density NV and LD (approximately-equal-to) 0.7 × NV−1/3. EBIC investigations of individual precipitates reveal contrasts up to 40% demonstrating NiSi2 particles to be efficient recombination centers.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 64 (1988), S. 3330-3330 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 63 (1988), S. 1569-1579 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A new electron-beam-induced current method is proposed for the depth profiling of nonuniform minority-carrier diffusion lengths in semiconductors. An induced current scan is obtained on a Schottky diode formed on the surface of a beveled sample and converted into a collection efficiency profile η(z). From this profile the depth distribution of the diffusion length L(z) is deduced using a direct reconstruction algorithm. To check consistency, a propagation-matrix based method is developed to calculate η(z) for arbitrary L(z). The model underlying these measurements, in its more general form, holds for an extended generation and includes the presence of the depletion layer. The proposed method is tried both on artificial data and experimental η(z) profiles obtained in intrinsically gettered silicon samples. The results show, in particular, that the trend of L(z) does not, in general, follow that of η(z). The connection between charge-collection efficiency and the diffusive component of the reverse current of a diode with nonuniform L(z) is also discussed.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 2513-2515 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The recombination activity of well-defined NiSi2 precipitates and of misfit dislocations in Ni contaminated Si samples has been investigated using the technique of the electron-beam-induced current in dependence on sample temperature and beam current. Individual NiSi2 precipitates are found to show a high recombination activity, increasing slightly with temperature and decreasing with increasing beam current. On the other hand, misfit dislocations are nearly inactive at room temperature and increase their activity upon cooling the sample. The experimental findings are discussed in terms of recombination activity controlled by either defect charging or shallow centers.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 63 (1993), S. 2085-2087 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Misfit dislocations in as-grown and Ni-contaminated Si/SiGe epilayers have been characterized by cathodoluminescence (CL) spectroscopy, cathodoluminescence imaging, and the electron beam induced current technique (EBIC). Dislocations in the as-grown layers had no radiative recombination (D bands) and no detectable room temperature EBIC contrast. Following Ni contamination the D bands were observed and the EBIC contrast increased. CL dark line contrast is observed by monochromatic imaging of the Si substrate luminescence. The CL dark line contrast was observed from all the dislocations, whether contaminated or as grown. The CL dark line contrast and EBIC contrast show a 1:1 correspondence of the nonradiative recombination at the misfit dislocation and also a semiquantitative agreement with the variation in measured contrast of the individual dislocations.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 65 (1994), S. 2804-2806 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Photoluminescence spectroscopy and electron-beam-induced current (EBIC) technique have been used to characterize misfit dislocations in Si/SiGe epilayers following hydrogen plasma treatment (T=200–500 °C). Low temperature EBIC measurements showed that the majority (90%) of shallow levels associated with misfit dislocations were not passivated, whereas deeper midgap levels are readily passivated. The dislocation (D bands) related luminescence features were all reduced in intensity following hydrogen treatment; at T=300 °C the D1 was preferentially passivated and could no longer be observed, whereas the other D bands although reduced in intensity could still be observed. Depassivation experiments showed that following posthydrogenation annealing at 600 °C the deep levels passivated as measured by EBIC and the D bands are regenerated. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 76 (2000), S. 697-699 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Cross-sectional and temperature-dependent measurements of the electron-beam-induced current reveal the depth profile of the recombination activity of grain boundaries and intragrain dislocations in cast multicrystalline Si. After remote hydrogen plasma treatment for 1 h at 310 °C, defects are passivated down to a depth of 100 μm. Even the activity of crystal defects exhibiting small or not detectable room temperature contrast is further reduced by hydrogenation. We interpret the experimental data in terms of a recently developed model, which relates the temperature behavior of the recombination activity to the density of (contaminant-induced) deep levels at the defects. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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