Keywords:
Forschungsbericht
;
Fotolithografie
;
Maskentechnik
;
Photoresist
Description / Table of Contents:
Lithography, mask, reticle, resist, micropatterning
Type of Medium:
Online Resource
Pages:
Online-Ressource ([5], 30 p. = 1,06 MB)
,
ill., graphs
Edition:
[Elektronische Ressource]
URL:
https://edocs.tib.eu/files/e01fb02/356973085.pdf
URL:
https://edocs.tib.eu/files/e01fb02/356973085l.pdf
Language:
German
,
English
Note:
Contract BMBF 01 M 2995 A. - Differences between the printed and electronic version of the document are possible. - nBibliography
,
Also available as printed version
,
Systemvoraussetzungen: Acrobat Reader.
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