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Thin-oxide charging damage to microelectronic test structures in an electron-cyclotron-resonance plasma (1995)

Friedmann, J. B. ; Shohet, J. L. ; McVittie, J. P. ; [et al.]

Woodbury, NY : American Institute of Physics (AIP)

Applied Physics Letters 67 (1995), S. 3718-3720

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ISSN: 1077-3118

Source: AIP Digital Archive

Topics: Physics

Notes: Processing yields in electron-cyclotron-resonance (ECR) and other high-density plasma sources will be increasingly limited by plasma-induced damage. This work investigates the effects of plasma nonuniformities on charging damage to polysilicon-gate MOS capacitor test structures exposed to O2 ECR plasmas. The nonuniformities were produced by independently biasing electrodes located above the wafer. The damage was characterized with ramp-voltage breakdown measurements. Comparison of calculated profiles of the potential difference across the gate-oxide layers of the MOS capacitors with whole wafer maps of the breakdown voltage measurements shows that maximum damage occurs where the oxide potential difference is largest but only in the presence of plasma nonuniformities. © 1995 American Institute of Physics.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.115360

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The electrostatic potentials in an electron-cyclotron-resonance processing plasma (1992)

Ashtiani, K. A. ; Shohet, J. L. ; Anderson, F. S. B. ; [et al.]

Springer

Plasma chemistry and plasma processing 12 (1992), S. 161-175

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ISSN: 1572-8986

Keywords: Electrostatic potentials ; electron-cyclotron resonance ; magnetic mirror ; emissive probes

Source: Springer Online Journal Archives 1860-2000

Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Technology

Notes: Abstract The axial distribution of the electrostatic potentials ofan electron-cyclotron resonance (ECR) processing plasma confined in a do magnetic mirror geometry was characterized. The potential profiles far argon and helium at 8.0x 10−4 and 4.0 × 10−4 Torr were measured using electron emissive probes. The experimental measurements were then compared with the predictions of a one-dimensional, electrostatic, particle-in-cell computer code which runs on a personal computer. The potential profiles as predicted by the code showed good agreement with the experimental measurements.