Keywords:
Electronic books.
Description / Table of Contents:
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. Ideally suited for Master/PhD students who need a basic understanding of nanolithography techniques and their applications. The book also contains state-of-the-art information for researchers needing to expand their knowledge of nanofabrication.
Type of Medium:
Online Resource
Pages:
1 online resource (450 pages)
Edition:
1st ed.
ISBN:
9780750326087
Series Statement:
IOP Ebooks Series
URL:
https://ebookcentral.proquest.com/lib/geomar/detail.action?docID=31252774
Language:
English
Note:
Intro -- Preface -- Acknowledgements -- Editor biography -- José Maria De Teresa -- List of contributors -- Chapter 1 Introduction to nanolithography techniques and their applications -- 1.1 Key concepts in nanolithography -- 1.1.1 Top-down versus self-assembly and self-organization processes -- 1.1.2 Resolution, cost, throughput and complexity -- 1.2 Nanolithography techniques using resists -- 1.2.1 Optical lithography (OL) -- 1.2.2 Electron beam lithography (EBL) -- 1.2.3 Nanoimprint lithography (NIL) -- 1.3 Direct nanolithography techniques -- 1.3.1 Focused ion beam (FIB) -- 1.3.2 Focused electron/ion beam induced deposition (FEBID and FIBID) -- 1.3.3 Scanning probe lithography (SPL) -- 1.4 Other nanolithography techniques and hybrid approaches -- 1.4.1 Stencil lithography -- 1.4.2 Nanosphere/colloidal lithography -- 1.4.3 Hybrid approaches -- 1.5 Comparison of nanolithography techniques -- 1.6 Applications of nanolithography techniques -- 1.6.1 Classical applications -- 1.6.2 Interdisciplinary applications -- 1.6.3 Emergent and future applications -- 1.7 End-of-chapter summary -- 1.8 Students' corner -- Acknowledgements -- References -- Chapter 2 Optical lithography -- 2.1 Concept of optical lithography -- 2.2 Optical lithography using optical masks -- 2.2.1 Optical lithography exposure modes and their resolution -- 2.2.2 Photo-resists -- 2.2.3 Extreme ultraviolet (EUV) optical lithography -- 2.3 Maskless optical lithography -- 2.3.1 Direct laser lithography -- 2.3.2 Two-photon lithography -- 2.4 Directed self-assembly (DSA) -- 2.4.1 Principles of DSA of block copolymers -- 2.4.2 Strategies for alignment of block copolymers -- 2.4.3 Applications -- 2.5 End-of-chapter summary -- 2.6 Student's corner -- References -- Chapter 3 Electron beam lithography and its use on 2D materials -- 3.1 Introduction -- 3.2 Fundamentals of EBL.
,
3.2.1 Chamber and electron column -- 3.2.2 Basic and lift-off EBL processes -- 3.2.3 Resolution -- 3.2.4 Scan modes, writing field, DAC, stitching, beam stability -- 3.2.5 Resists -- 3.2.6 Cross-linking problem -- 3.3 Steps for a successful EBL process -- 3.3.1 Spin coating -- 3.3.2 EBL on a bare wafer (WA& -- #62 -- WF) -- 3.3.3 EBL in a wafer with alignment markers (WA< -- WF) -- 3.3.4 Two different resists: polymethylmethacrylate (PMMA) versus higher resolution hydrogen silsesquioxane (HSQ) -- 3.4 ICP-RIE and E-beam evaporation -- 3.4.1 ICP-RIE -- 3.4.2 E-beam metal evaporation -- 3.5 EBL applied to 2D materials -- 3.5.1 Hall bars in graphene heterostructures -- 3.5.2 Quantum point contacts defined by cryo-etching -- 3.5.3 Dual-gated graphene FETs -- 3.5.4 Hall bars in other 2D materials -- 3.6 General applications and new developments in EBL technique -- 3.7 End-of-chapter summary -- 3.8 Student's corner -- Acknowledgements -- References -- Chapter 4 Focused electron beam induced deposition -- 4.1 Introduction -- 4.2 Principles of FEBID -- 4.2.1 Electron-matter interaction -- 4.2.2 Monte Carlo method towards FEBID simulations -- 4.2.3 Single precursor species model -- 4.2.4 General features of FEBID precursors, growth parameters and applications -- 4.3 FEBID precursors and deposited materials -- 4.3.1 Precursors and properties of as-grown materials -- 4.3.2 Improving properties -- 4.4 Applications -- 4.5 Additional FEBID strategies and novel developments -- 4.6 End-of-chapter summary -- 4.7 Student's corner -- Acknowledgements -- References -- Chapter 5 Focused ion beam induced processing -- 5.1 Introduction -- 5.2 The instrument -- 5.2.1 Historical development -- 5.2.2 Ion sources -- 5.2.3 Ion column -- 5.2.4 Gas injection system -- 5.2.5 Process chamber and electron/ion detectors -- 5.2.6 Additional modules -- 5.3 Basics of FIB processing.
,
5.3.1 Ion-solid interactions -- 5.3.2 Operating the beam -- 5.4 Milling and materials modification -- 5.4.1 Milling -- 5.4.2 FIB irradiation for materials modification -- 5.5 Focused ion beam induced deposition -- 5.5.1 Fundamentals -- 5.5.2 Applications of FIBID -- 5.6 Other applications of focused ion beams -- 5.6.1 FIB-based imaging -- 5.6.2 FIB-based tomography -- 5.6.3 Secondary-ion mass spectrometry -- 5.6.4 Current developments and future challenges -- 5.7 End-of-chapter summary -- 5.8 Students' corner -- Acknowledgements -- List of acronyms -- References -- Chapter 6 Scanning probe lithography -- 6.1 Introduction: from atomic-scale modifications to scanning probe lithography -- 6.2 Oxidation SPL -- 6.2.1 Key aspects of o-SPL -- 6.2.2 Nanolithography -- 6.2.3 Beyond oxidation processes -- 6.3 Thermal SPL -- 6.3.1 Key aspects of t-SPL -- 6.3.2 Nanolithography -- 6.4 Deposition SPL -- 6.4.1 Key aspects of deposition SPL -- 6.4.2 Nanolithography -- 6.5 Other SPL methods -- 6.6 End-of-chapter summary -- 6.7 Student's corner -- Acknowledgments -- References -- Chapter 7 Soft thermal nanoimprint and hybrid processes to produce complex structures -- 7.1 Fundamentals of nanoimprint processes -- 7.1.1 Introduction -- 7.1.2 Basic nanoimprint processes and variants -- 7.2 Soft thermal nanoimprint lithography (soft T-NIL) -- 7.2.1 Thermoplastic polymers for soft T-NIL -- 7.2.2 Molds for soft T-NIL -- 7.3 Complex structures by soft thermal nanoimprint and hybrid processes -- 7.3.1 Introduction -- 7.3.2 High-aspect ratio imprinting -- 7.3.3 Multilevel hierarchical complex nanoimprinting -- 7.4 End-of-chapter summary -- 7.5 Student's corner -- References -- Chapter 8 Stencil lithography -- 8.1 Introduction -- 8.1.1 Brief history of stencil in micropatterning -- 8.1.2 Why is stencil lithography interesting? -- 8.1.3 Why is stencil lithography challenging?.
,
8.2 Fabrication of stencil membranes -- 8.2.1 Membrane material -- 8.2.2 Fabrication steps -- 8.2.3 Membrane reinforcement -- 8.3 Challenges of stencil lithography -- 8.3.1 Blurring -- 8.3.2 Shadowing -- 8.3.3 Clogging -- 8.3.4 Cracking and bending -- 8.4 Design considerations -- 8.4.1 Process as collimated as possible -- 8.4.2 Thin but robust membranes -- 8.4.3 Durable material (both mechanically and chemically) -- 8.4.4 Surface treatment -- 8.4.5 Reducing gap -- 8.5 Alignment -- 8.6 Dynamic stencil -- 8.7 Applications -- 8.8 End of chapter summary -- 8.9 Student's corner -- Acknowledgements -- References -- Chapter 9 Ice lithography -- 9.1 Introduction and historical perspective -- 9.2 Fundamentals -- 9.2.1 Energetic electrons -- 9.2.2 Ices, condensed gases in vacuum -- 9.2.3 Electron-ice interactions -- 9.2.4 Summary -- 9.3 Lithography using electrons and ices -- 9.3.1 Ice lithography process -- 9.3.2 Ice lithography resist -- 9.3.3 Ice lithography instrument -- 9.4 Applications -- 9.4.1 Nanofabrication on 3D structures -- 9.4.2 Nanofabrication on fragile structures -- 9.4.3 Rapid prototyping -- 9.4.4 High-resolution patterning -- 9.5 Future research, opportunities and challenges -- 9.5.1 Fundamental science research -- 9.5.2 Icetronics research -- 9.5.3 Applications -- 9.6 End-of-chapter summary -- 9.7 Student's corner -- References -- Chapter 10 Magnetic nanopatterning via thermal scanning probe lithography -- 10.1 Introduction -- 10.2 Thermally-assisted magnetic scanning probe lithography -- 10.2.1 Concept -- 10.2.2 Patterning magnetic domains, domain walls and solitons -- 10.2.3 Writing spin textures in synthetic antiferromagnets -- 10.2.4 Features and capabilities of tam-SPL -- 10.3 Nanopatterned spin textures for magnonics -- 10.3.1 Controlling the spin-wave excitation and propagation with magnetic domains.
,
10.3.2 Nanoscale spin-wave circuits based on spin textures -- 10.3.3 Optically inspired nanomagnonics in synthetic antiferromagnets -- 10.4 End-of-chapter summary -- 10.5 Student's corner -- Acknowledgements -- References -- Chapter 11 Nanofabrication of three-dimensional magnetic structures -- 11.1 Introduction -- 11.1.1 3D magnetic nanostructures for the future -- 11.2 Overview of nanofabrication techniques for magnetism -- 11.3 Direct-write techniques for 3D nanofabrication of magnetic materials -- 11.4 Focused electron beam induced deposition -- 11.4.1 FEBID for magnetism -- 11.4.2 FEBID fundamentals -- 11.4.3 FEBID resolution -- 11.4.4 FEBID theory, modelling and practical recommendations -- 11.4.5 FEBID: 3D nanopatterning algorithms -- 11.4.6 FEBID and thin film deposition: hybrid approach for 3D nanopatterning -- 11.5 Two-photon lithography -- 11.5.1 Two-photon lithography for 3D nanomagnetism -- 11.5.2 Examples of scaffold lithography using two-photon lithography -- 11.6 Electrodeposition of 3D materials -- 11.6.1 Electrodeposition for 3D nanomagnetism -- 11.6.2 Electrodeposition of nanowires -- 11.6.3 Nanostructured multilayered nanowires -- 11.6.4 Electrodeposition of complex structures -- 11.7 End-of-chapter summary -- 11.8 Student's corner -- References -- Chapter 12 FEBIP for functional nanolithography of 2D nanomaterials -- 12.1 Introduction -- 12.2 Atomic manipulation of 2D nanomaterials -- 12.2.1 Defect engineering of 2D nanomaterials -- 12.2.2 Directing matter: atomic forging with in situ imaging and material manipulations -- 12.3 Directed surface and interface modification of graphene-based nanomaterials using focused electron beam and precursor molecules -- 12.3.1 Graphene oxide -- 12.3.2 Other members of graphene-based nanomaterials -- 12.4 Focused electron beam induced etching (FEBIE) of 2D nanomaterials.
,
12.5 Applications of the FEBIP techniques to 2D nanomaterial-based electronic devices.
Permalink
