In:
Applied Physics Letters, AIP Publishing, Vol. 105, No. 4 ( 2014-07-28)
Abstract:
This work presents p-channel and n-channel junctionless (JL) polycrystalline silicon (poly-Si) nanowires gate-all-around (GAA) nonvolatile memory (NVM) devices with silicon nanocrystals charge trapping layer. Experimental results indicate that the n-channel device has better programming efficiency and p-channel device has better erasing efficiency. For p-channel device, an extrapolation of the memory window to 10 yr demonstrates that 95% of the stored charge can be retained at high temperature of 85 °C. Such the p-channel and n-channel JL-GAA NVMs are feasible for use in system-on-panel (SOP) and 3-D stacked flash memory applications.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
2014
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
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