In:
Journal of Applied Physics, AIP Publishing, Vol. 104, No. 4 ( 2008-08-15)
Abstract:
Hydrogenated amorphous carbon films were deposited on Si (100) substrates using dc-pulse plasma chemical vapor deposition. Structurally, the as-deposited carbon films could be considered as nanocomposite thin films with fullerenelike microstructure in diamondlike carbon matrix based on our previous result [Q. Wang et al., Appl. Phys. Lett. 91, 141902 (2007)]. In this paper, the evolution of the structure and the mechanical properties of hydrogenated carbon films with fullerenelike microstructure on the annealing in vacuum was investigated. The fullerenelike hydrogenated carbon films annealed at 500 °C showed higher hardness (16.9% harder) and higher elastic recovery (11.2% higher) than the as-deposited films. The friction coefficient of fullerenelike hydrogenated carbon films in air with 40% relative humidity remained constant at about 0.037 when annealed at 600 °C. The wear rate of the films decreased sharply when annealed at 200 or 300 °C. Structural analys is shows that annealing at 300 °C improved tribological properties originated from the volume increase in the fullerenelike microstructure, and further annealing at 600 °C improved mechanical properties originated from the transformation of nanosized curved sp2 to sp3 clusters.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
2008
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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