In:
Technical Physics Letters, Ioffe Institute Russian Academy of Sciences, Vol. 49, No. 4 ( 2023), p. 51-
Abstract:
The possibility of using a nanoporous Ge layer formed by implantation with 115 In + ions on a monocrystal c-Ge substrate as an antireflection optical coating (In:PGe) was studied. For this purpose, ion implantation of c-Ge wafers was performed at an energy E=30 keV, current density in the ion beam J=5 μA/cm 2 , and dose D=1.8· 10 16 ion/cm 2 . It was shown that the fabricated In:PGe spongy layer, which consists of intertwining Ge nanowires, is characterized by a low reflectivity (~ 5%) in a wide optical spectral range of 250-1050 nm. Keywords: nanoporous germanium, ion implantation, antireflection optical coating.
Type of Medium:
Online Resource
ISSN:
1726-7471
DOI:
10.21883/TPL.2023.04.55878.19466
Language:
English
Publisher:
Ioffe Institute Russian Academy of Sciences
Publication Date:
2023
Permalink