In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 59, No. 7 ( 2020-07-01), p. 071007-
Abstract:
To produce high-quality GaN (0001) substrates with a low threading dislocation density (TDD) and a small off-angle variation, we have developed a technique named the “maskless-3D method.” This method, which is applied during GaN boule growth by hydride vapor phase epitaxy (HVPE), induces three-dimensional (3D) growth on a normal GaN (0001) seed substrate. We showed that by an appropriate choice of HVPE conditions, and without using a mask, the 3D growth shape was controlled to eliminate the c -plane and thereby suppress the propagation of dislocations from the seed. Subsequently, two-dimensional (2D) growth was carried out on the 3D structure. This 2D growth area was machined to produce a 2 inch GaN substrate with a TDD of about 4 × 10 5 cm −2 and an off-angle variation of 0.05°. We also confirmed that it was possible to insert the 3D growth area twice, thereby further reducing the TDD to 10 4 cm −2 .
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.35848/1347-4065/ab9d5f
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2020
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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