In:
physica status solidi (RRL) – Rapid Research Letters, Wiley, Vol. 8, No. 1 ( 2014-01), p. 44-47
Abstract:
A very thin (250 nm), highly conductive (annealed), non‐texturized DC‐sputtered aluminum‐doped zinc oxide layer (ZnO:Al) deposited on a textured glass is used as substrate for thin‐film silicon solar cells. Compared to the classical approach, where wet‐chemically texturized ZnO:Al on planar glass is used, this approach allows a reduction in the as‐deposited ZnO:Al thickness of almost 70% while at the same time, thanks to the good light trapping capability of the glass texture the efficiency of the cells was maintained at the high level of 10.9%. magnified image (© 2014 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Type of Medium:
Online Resource
ISSN:
1862-6254
,
1862-6270
DOI:
10.1002/pssr.201308195
Language:
English
Publisher:
Wiley
Publication Date:
2014
detail.hit.zdb_id:
2259465-6
Permalink