In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 40, No. 6B ( 2001-06-01), p. L631-
Abstract:
The dual-RF-plasma chemical vapor deposition (dual-RF CVD) technique was examined for the formation of large areas of vertically aligned multiwalled carbon nanotubes (MWNTs). Two RF powers, Pdischarge ( P dis ) and Psubstrate ( P sub ), were used for the dissociation of methane gas and control of the energy of positive ions impinging on the substrates, respectively. The P sub is necessary for the formation of MWNTs, without which a foil-like carbon nanostructured film was deposited. The positive ion bombardment works to suppress the deposition of amorphous carbon films and foil-like carbon nanostructures. Formation of MWNTs was observed within an area of 25 cm 2 under the experimental setup. A threshold temperature between 500 to 540°C was defined for the formation of vertically aligned MWNTs.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.40.L631
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2001
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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