In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 16, No. 2 ( 1998-03-01), p. 796-798
Abstract:
Uniform arrays of sharp polysilicon field emitters have been fabricated in gridded configuration using state of the art microfabrication techniques including high resolution electron beam lithography and plasma dry etching. Emission currents up to 2.5 μA/tip have been obtained at a 90 V grid-bias. Preliminary lifetime measurements (14 h continuous operation) have been carried out under ultrahigh vacuum conditions.
Type of Medium:
Online Resource
ISSN:
1071-1023
,
1520-8567
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1998
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
3117333-0
detail.hit.zdb_id:
1475429-0
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