In:
Review of Scientific Instruments, AIP Publishing, Vol. 79, No. 2 ( 2008-02-01)
Abstract:
To investigate a Cs behavior, optical diagnostic tools have been installed in the large negative ion source, an arc discharge used at large helical device neutral beam injector. A large Cs sputtering is observed during beam extraction due to the backstreaming H+ ions. Distribution of Cs+ light is uniform in the case of a balanced arc discharge, but large increase of Cs+ light during beam extraction is observed in a nonuniform arc discharge. Controlling of the discharge uniformity is effective to reduce the local heat loading from the backstreaming H+ ions at the backplate of ion source.
Type of Medium:
Online Resource
ISSN:
0034-6748
,
1089-7623
Language:
English
Publisher:
AIP Publishing
Publication Date:
2008
detail.hit.zdb_id:
209865-9
detail.hit.zdb_id:
1472905-2
SSG:
11
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