In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 33, No. 11R ( 1994-11-01), p. 6410-
Abstract:
Ultrathin films of 2–10 nm thickness were deposited by pulsed discharge plasma polymerization. The film
surface topography was studied by an atomic force microscope (AFM), which showed that the films are smooth and pinhole-free. The AFM was used to produce nanometer-scale indentations/holes in these deposited ultrathin organic
films. The patterning process is governed by several factors: mechanical and Coulomb forces, heat effects, material transfer, and electric charge deposition depending on the conditions. The patterning results indicate the AFM can be
used for the formation of nanometer-scale structures.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.33.6410
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1994
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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