In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 16, No. 3 ( 1998-05-01), p. 1150-1154
Abstract:
We report on the modification of a conventional scanning transmission electron microscope (CM12, Philips) for electron-beam lithography. The hardware as well as the entirely home designed lithography software are described in detail. Special attention is paid to the reduction of the proximity effect by means of our lithography software using a fairly simple exposure model. Various lithography results are shown including nonmagnetic as well as ferromagnetic nanostructures with linewidths as small as 20 nm. Problems occurring when fabricating magnetic nanostructures and their solutions are presented and discussed.
Type of Medium:
Online Resource
ISSN:
1071-1023
,
1520-8567
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1998
detail.hit.zdb_id:
3117331-7
detail.hit.zdb_id:
3117333-0
detail.hit.zdb_id:
1475429-0
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