In:
Modern Physics Letters B, World Scientific Pub Co Pte Ltd, Vol. 33, No. 29 ( 2019-10-20), p. 1950359-
Abstract:
During the sputtering-deposition process, the temperature of film growth surface is more important than that of the substrate, which could seriously influence the film growth behavior. While, it is difficult to measure the temperature of film growth surface, because of the low space resolution of traditional temperature measurement systems. In this paper, the temperature of TiO 2 film growth surface and substrate were monitored by the home-made NiCr/NiSi film thermocouple and standard NiCr/NiSi K type wire thermocouple. With the same sputtering parameters, the temperature of TiO 2 film growth surface could reach [Formula: see text]C. While, the temperature of substrate was only about [Formula: see text] C. Finally, combining the temperature of film growth surface in sputtering-deposition process, the film growth behavior can be investigated and controlled in future.
Type of Medium:
Online Resource
ISSN:
0217-9849
,
1793-6640
DOI:
10.1142/S0217984919503597
Language:
English
Publisher:
World Scientific Pub Co Pte Ltd
Publication Date:
2019
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