In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 8A ( 1997-08-01), p. L979-
Abstract:
Using an aqueous solution of ammonia hydroxide aqua, hydrosilicofluoric acid and boric acid, an oxynitride film can be obtained. Using such a liquid phase deposition method, the growth rate and the refractive index increase with the mole concentration of ammonia hydroxide aqua. After thermal anealing in nitrogen ambient the thickness decreases but the refractive index increases. This distribution of nitrogen atoms accumulate at the interface of oxynitride and silicon. A model is proposed to explain it.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.L979
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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