In:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, Vol. 9, No. 4 ( 1991-07-01), p. 2374-2377
Abstract:
Hollow cathode discharges produce higher densities of sputtered particles than conventional discharges and can be utilized for thin film deposition. A prototype hollow cathode sputter source has therefore been built and tested. The deposition of copper and the superconductor YBa2Cu3O7−x produced thin films of good quality. The method can be upscaled for a uniform deposition of tapes, wires, large-area substrates, and for the parallel deposition of multiple substrates.
Type of Medium:
Online Resource
ISSN:
0734-2101
,
1520-8559
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1991
detail.hit.zdb_id:
1475424-1
detail.hit.zdb_id:
797704-9
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