In:
Crystal Research and Technology, Wiley, Vol. 49, No. 11 ( 2014-11), p. 860-864
Abstract:
In this study, large‐area and uniform thickness novel nano‐sheet structured CuS thin films on ITO glass have been prepared by the one‐step electrodeposition method from a dimethyl sulfoxide solution. Thin films of completely preserved nano‐sheet like morphology of Cu y S (y = 1.75, 1.8, 1.95, and 2.0) are grown by vacuum annealing CuS thin films at 500 °C for different lengths of time. The 500 °C sample heated for 10 hours was nearly converted to single phase of Cu 2 S with y ∼ 2. The optical direct band gaps of nano‐sheet Cu y S thin films annealed at 500 °C of 2, 6, and 10 hours in vacuum were found to be 1.94, 1.68, and 1.44 eV, respectively.
Type of Medium:
Online Resource
ISSN:
0232-1300
,
1521-4079
DOI:
10.1002/crat.201400176
Language:
English
Publisher:
Wiley
Publication Date:
2014
detail.hit.zdb_id:
1480828-6
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