In:
Journal of Materials Research, Springer Science and Business Media LLC, Vol. 10, No. 2 ( 1995-02), p. 447-452
Abstract:
The electron cyclotron resonance plasma enhanced chemical vapor deposition (ECR PECVD) method is used to prepare ferroelectric PbTiO 3 films. Single-phase perovskite PbTiO 3 films with smooth surfaces and fine grain size were successfully fabricated on Pt/Ti/SiO 2 /Si substrates at low temperatures of 400–500 °C using metal-organic (MO) sources. The chemical compositions, structural phases, surface morphologies, and depth profiles of the PbTiO 3 thin films were investigated using EDS, XRD, SEM, RBS, and AES. Variations of those properties with process temperature and gas supply ratio are discussed. When the process temperature was above 450 °C, the stoichiometric perovskite PbTiO 3 films could be obtained even though the MO source supply ratio was varied in a wide range if the oxygen supply was sufficient.
Type of Medium:
Online Resource
ISSN:
0884-2914
,
2044-5326
DOI:
10.1557/JMR.1995.0447
Language:
English
Publisher:
Springer Science and Business Media LLC
Publication Date:
1995
detail.hit.zdb_id:
54876-5
detail.hit.zdb_id:
2015297-8
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