In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 53, No. 4S ( 2014-04-01), p. 04ER10-
Abstract:
Nitride-based nanopillars were successfully fabricated by nanoimprint lithography. A nanowhisker of indium–tin oxide (ITO) deposited by on oblique evaporation method was investigated in nitride-based nanopillars and thin ZnO layers grown by atomic layer deposition (ALD). From the results of field-emission scanning electron microscopy (SEM) measurement, it was found that ITO whiskers grew on nitride-based nanopillars covered with ZnO. Moreover, from the results of UV–visible spectrophotometry and bidirectional reflectance distribution function (BRDF) measurements, it was found that this hybrid structure of ITO nanowhiskers above a ZnO medium enhanced the broadband and angle-independent antireflection in the range between 380 and 600 nm. We used the hybrid design of the ITO/ZnO structure to achieve the lowest reflectance value between 3.8 and 10.9% in a quantum well absorption range.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAP.53.04ER10
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2014
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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