GLORIA

GEOMAR Library Ocean Research Information Access

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Online Resource
    Online Resource
    AIP Publishing ; 2003
    In:  Review of Scientific Instruments Vol. 74, No. 3 ( 2003-03-01), p. 1377-1379
    In: Review of Scientific Instruments, AIP Publishing, Vol. 74, No. 3 ( 2003-03-01), p. 1377-1379
    Abstract: Spatial-phase-locked electron-beam lithography is a method of precisely locating pattern elements on a substrate by providing real-time feedback of the beam’s location by means of a fiducial grid located on the substrate surface. Previously, this technique has been demonstrated in Gaussian-beam systems, in one and two dimensions. In this note we propose a method of extending the spatial-phase-locking concept to a vector shaped-beam architecture. In the proposed method, an image of a screen grid is superimposed on the projected shape, and this grid image is dithered in X and Y to provide a periodic signal whose phase can be interpreted to determine the position of the projected shape relative to the fiducial grid.
    Type of Medium: Online Resource
    ISSN: 0034-6748 , 1089-7623
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2003
    detail.hit.zdb_id: 209865-9
    detail.hit.zdb_id: 1472905-2
    SSG: 11
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 2
    Online Resource
    Online Resource
    Elsevier BV ; 2000
    In:  Microelectronic Engineering Vol. 53, No. 1-4 ( 2000-6), p. 95-99
    In: Microelectronic Engineering, Elsevier BV, Vol. 53, No. 1-4 ( 2000-6), p. 95-99
    Type of Medium: Online Resource
    ISSN: 0167-9317
    Language: English
    Publisher: Elsevier BV
    Publication Date: 2000
    detail.hit.zdb_id: 605230-7
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 3
    Online Resource
    Online Resource
    AIP Publishing ; 2002
    In:  Applied Physics Letters Vol. 81, No. 7 ( 2002-08-12), p. 1315-1317
    In: Applied Physics Letters, AIP Publishing, Vol. 81, No. 7 ( 2002-08-12), p. 1315-1317
    Abstract: Sub-50 nm lines, holes, and posts have been patterned photolithographically using near-field embedded-amplitude masks and an exposing wavelength of 220 nm generated by an arc-lamp source. Interference in the optical near field is utilized to produce the fine patterns. In some cases, the feature sizes on the mask are more than six times larger than the size of the smallest features patterned on the substrate. Numerical simulations support the experimental results.
    Type of Medium: Online Resource
    ISSN: 0003-6951 , 1077-3118
    RVK:
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2002
    detail.hit.zdb_id: 211245-0
    detail.hit.zdb_id: 1469436-0
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 4
    Online Resource
    Online Resource
    IOP Publishing ; 1997
    In:  Japanese Journal of Applied Physics Vol. 36, No. 12S ( 1997-12-01), p. 7557-
    In: Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 12S ( 1997-12-01), p. 7557-
    Abstract: The global-fiducial grid mode of spatial-phase-locked electron-beam lithography in two dimensions is investigated. A phase-locking scheme for two-dimensions is proposed and analyzed. An expression for the minimum locking dose is derived. The use of a scintillating grid is proposed, and results from optical detection of a scintillating fiducial grating are reported.
    Type of Medium: Online Resource
    ISSN: 0021-4922 , 1347-4065
    RVK:
    RVK:
    RVK:
    Language: Unknown
    Publisher: IOP Publishing
    Publication Date: 1997
    detail.hit.zdb_id: 218223-3
    detail.hit.zdb_id: 2006801-3
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 5
    Online Resource
    Online Resource
    Elsevier BV ; 1999
    In:  Microelectronic Engineering Vol. 46, No. 1-4 ( 1999-5), p. 145-148
    In: Microelectronic Engineering, Elsevier BV, Vol. 46, No. 1-4 ( 1999-5), p. 145-148
    Type of Medium: Online Resource
    ISSN: 0167-9317
    Language: English
    Publisher: Elsevier BV
    Publication Date: 1999
    detail.hit.zdb_id: 605230-7
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 6
    Online Resource
    Online Resource
    American Vacuum Society ; 2001
    In:  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena Vol. 19, No. 6 ( 2001-11-01), p. 2499-2503
    In: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 19, No. 6 ( 2001-11-01), p. 2499-2503
    Abstract: The performance of a Raith 150 electron-beam lithography system is reported. The system’s resolution, stability, intrafield distortion, stitching, and overlay performance are evaluated. Patterning at low- and high-acceleration voltages is compared. The system was used to pattern sub-20 nm features, and the largest intrafield distortion for a 100 μm field was measured to be 15 nm. Pattern-placement accuracy below 35 nm, mean plus twice the standard deviation, was demonstrated.
    Type of Medium: Online Resource
    ISSN: 1071-1023 , 1520-8567
    RVK:
    Language: English
    Publisher: American Vacuum Society
    Publication Date: 2001
    detail.hit.zdb_id: 3117333-0
    detail.hit.zdb_id: 797726-8
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 7
    Online Resource
    Online Resource
    AIP Publishing ; 2000
    In:  Applied Physics Letters Vol. 76, No. 6 ( 2000-02-07), p. 667-669
    In: Applied Physics Letters, AIP Publishing, Vol. 76, No. 6 ( 2000-02-07), p. 667-669
    Type of Medium: Online Resource
    ISSN: 0003-6951 , 1077-3118
    RVK:
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2000
    detail.hit.zdb_id: 211245-0
    detail.hit.zdb_id: 1469436-0
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
  • 8
    Online Resource
    Online Resource
    American Meteorological Society ; 2007
    In:  Monthly Weather Review Vol. 135, No. 9 ( 2007-09-01), p. 3070-3085
    In: Monthly Weather Review, American Meteorological Society, Vol. 135, No. 9 ( 2007-09-01), p. 3070-3085
    Abstract: For the first time, the NOAA/Aircraft Operations Center (AOC) flew stepped frequency microwave radiometers (SFMRs) on both WP-3D research aircraft for operational hurricane surface wind speed measurement in 2005. An unprecedented number of major hurricanes provided ample data to evaluate both instrument performance and surface wind speed retrieval quality up to 70 m s−1 (Saffir–Simpson category 5). To this end, a new microwave emissivity–wind speed model function based on estimates of near-surface winds in hurricanes by global positioning system (GPS) dropwindsondes is proposed. For practical purposes, utilizing this function removes a previously documented high bias in moderate SFMR-measured wind speeds (10–50 m s−1), and additionally corrects an extreme wind speed ( & gt;60 m s−1) underestimate. The AOC operational SFMRs yield retrievals that are precise to within ∼2% at 30 m s−1, which is a factor of 2 improvement over the NOAA Hurricane Research Division’s SFMR, and comparable to the precision found here for GPS dropwindsonde near-surface wind speeds. A small (1.6 m s−1), but statistically significant, overall high bias was found for independent SFMR measurements utilizing emissivity data not used for model function development. Across the range of measured wind speeds (10–70 m s−1), SFMR 10-s averaged wind speeds are within 4 m s−1 (rms) of the dropwindsonde near-surface estimate, or 5%–25% depending on speed. However, an analysis of eyewall peak wind speeds indicates an overall 2.6 m s−1 GPS low bias relative to the peak SFMR estimate on the same flight leg, suggesting a real increase in the maximum wind speed estimate due to SFMR’s high-density sampling. Through a series of statistical tests, the SFMR is shown to reduce the overall bias in the peak surface wind speed estimate by ∼50% over the current flight-level wind reduction method and is comparable at extreme wind speeds. The updated model function is demonstrated to behave differently below and above the hurricane wind speed threshold (∼32 m s−1), which may have implications for air–sea momentum and kinetic energy exchange. The change in behavior is at least qualitatively consistent with recent laboratory and field results concerning the drag coefficient in high wind speed conditions, which show a fairly clear “leveling off” of the drag coefficient with increased wind speed above ∼30 m s−1. Finally, a composite analysis of historical data indicates that the earth-relative SFMR peak wind speed is typically located in the hurricane’s right-front quadrant, which is consistent with previous observational and theoretical studies of surface wind structure.
    Type of Medium: Online Resource
    ISSN: 1520-0493 , 0027-0644
    RVK:
    Language: English
    Publisher: American Meteorological Society
    Publication Date: 2007
    detail.hit.zdb_id: 2033056-X
    detail.hit.zdb_id: 202616-8
    SSG: 14
    Location Call Number Limitation Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...