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  • 1
    Online Resource
    Online Resource
    Springer Science and Business Media LLC ; 2014
    In:  Nanoscale Research Letters Vol. 9, No. 1 ( 2014-12)
    In: Nanoscale Research Letters, Springer Science and Business Media LLC, Vol. 9, No. 1 ( 2014-12)
    Abstract: We report a synthesis of β-Ga 2 O 3 nanostructures on Si substrate by electrochemical deposition using a mixture of Ga 2 O 3 , HCl, NH 4 OH, and H 2 O. The presence of Ga 3+ ions contributed to the deposition of Ga 2 O 3 nanostructures on the Si surface with the assistance of applied potentials. The morphologies of the grown structures strongly depended on the molarity of Ga 2 O 3 and pH level of electrolyte. β-Ga 2 O 3 nanodot-like structures were grown on Si substrate at a condition with low molarity of Ga 2 O 3 . However, Ga 2 O 3 nanodot structures covered with nanorods on top of their surfaces were obtained at higher molarity, and the densities of nanorods seem to increase with the decrease of pH level. High concentration of Ga 3+ and OH - ions may promote the reaction of each other to produce Ga 2 O 3 nanorods in the electrolyte. Such similar nature of Ga 2 O 3 nanorods was also obtained by using hydrothermal process. The grown structures seem to be interesting for application in electronic and optoelectronic devices as well as to be used as a seed structure for subsequent chemical synthesis of GaN by thermal transformation method.
    Type of Medium: Online Resource
    ISSN: 1556-276X
    Language: English
    Publisher: Springer Science and Business Media LLC
    Publication Date: 2014
    detail.hit.zdb_id: 2253244-4
    detail.hit.zdb_id: 3149496-1
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  • 2
    Online Resource
    Online Resource
    Springer Science and Business Media LLC ; 2014
    In:  Nanoscale Research Letters Vol. 9, No. 1 ( 2014-12)
    In: Nanoscale Research Letters, Springer Science and Business Media LLC, Vol. 9, No. 1 ( 2014-12)
    Abstract: Gallium nitride (GaN) nanostructures were successfully synthesized by the nitridation of the electrochemically deposited gallium oxide (Ga 2 O 3 ) through the utilization of a so-called ammoniating process. Ga 2 O 3 nanostructures were firstly deposited on Si substrate by a simple two-terminal electrochemical technique at a constant current density of 0.15 A/cm 2 using a mixture of Ga 2 O 3 , HCl, NH 4 OH and H 2 O for 2 h. Then, the deposited Ga 2 O 3 sample was ammoniated in a horizontal quartz tube single zone furnace at various ammoniating times and temperatures. The complete nitridation of Ga 2 O 3 nanostructures at temperatures of 850°C and below was not observed even the ammoniating time was kept up to 45 min. After the ammoniating process at temperature of 900°C for 15 min, several prominent diffraction peaks correspond to hexagonal GaN (h-GaN) planes were detected, while no diffraction peak of Ga 2 O 3 structure was detected, suggesting a complete transformation of Ga 2 O 3 to GaN. Thus, temperature seems to be a key parameter in a nitridation process where the deoxidization rate of Ga 2 O 3 to generate gaseous Ga 2 O increase with temperature. The growth mechanism for the transformation of Ga 2 O 3 to GaN was proposed and discussed. It was found that a complete transformation can not be realized without a complete deoxidization of Ga 2 O 3 . A significant change of morphological structures takes place after a complete transformation of Ga 2 O 3 to GaN where the original nanorod structures of Ga 2 O 3 diminish, and a new nanowire-like GaN structures appear. These results show that the presented method seems to be promising in producing high-quality h-GaN nanostructures on Si.
    Type of Medium: Online Resource
    ISSN: 1556-276X
    Language: English
    Publisher: Springer Science and Business Media LLC
    Publication Date: 2014
    detail.hit.zdb_id: 2253244-4
    detail.hit.zdb_id: 3149496-1
    Location Call Number Limitation Availability
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  • 3
    Online Resource
    Online Resource
    American Chemical Society (ACS) ; 2019
    In:  The Journal of Physical Chemistry C Vol. 123, No. 19 ( 2019-05-16), p. 12460-12465
    In: The Journal of Physical Chemistry C, American Chemical Society (ACS), Vol. 123, No. 19 ( 2019-05-16), p. 12460-12465
    Type of Medium: Online Resource
    ISSN: 1932-7447 , 1932-7455
    RVK:
    Language: English
    Publisher: American Chemical Society (ACS)
    Publication Date: 2019
    detail.hit.zdb_id: 2256522-X
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