In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 8B ( 1999-08-01), p. L954-
Abstract:
Spatially resolved CF and CF 2 radical densities
were measured in low-pressure, high-density CF 4 plasmas with the addition of H 2 by
laser-induced fluorescence spectroscopy. Hollow radial distributions (the densities in the outside
region were higher than those in the plasma column) were observed for the radical densities.
Diffusion fluxes of the radicals from the outside region to the plasma column were evaluated from the slope of the
hollow density distributions. Linear correlations were found between the inward diffusion fluxes and
the gas-phase radical densities, suggesting that the gas-phase CF and CF 2 radical densities were determined not by the
electron-impact dissociation of CF 4 in the plasma column but by the production of radicals
in the outside region.
The source of the radicals in the outside region is the surface of the chamber wall covered with
fluorocarbon film.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.L954
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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