In:
Advanced Materials Research, Trans Tech Publications, Ltd., Vol. 60-61 ( 2009-1), p. 175-179
Abstract:
Based on the refraction theory of the lens, the SU-8 photoresist hard X-ray hourglass lenses with three different structure parameters are fabricated. The mask-back exposure technique is introduced to fabricate the lenses. The focusing performance of this device is tested at Beijing Synchrotron Radiation Facility (BSRF). At the distance of 1.65m from the lenses, an obviously focusing performance in one dimension is observed. The relative intensity of the lenses with the largest gain is about 217.7, the gain of the lens is about 1.15, and the dimension of the focus is about 33µm. The focusing performance of this device can be improved through the developing of the mask-back exposure technique.
Type of Medium:
Online Resource
ISSN:
1662-8985
DOI:
10.4028/www.scientific.net/AMR.60-61
DOI:
10.4028/www.scientific.net/AMR.60-61.175
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2009
detail.hit.zdb_id:
2265002-7
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