In:
Nanoscale Research Letters, Springer Science and Business Media LLC, Vol. 9, No. 1 ( 2014-12)
Abstract:
Silicon (Si) nanostructures that exhibit a significantly low reflectance in ultraviolet (UV) and visible light wavelength regions are fabricated using a hydrogen etching process. The fabricated Si nanostructures have aperiodic subwavelength structures with pyramid-like morphologies. The detailed morphologies of the nanostructures can be controlled by changing the etching condition. The nanostructured Si exhibited much more reduced reflectance than a flat Si surface: an average reflectance of the nanostructured Si was approximately 6.8% in visible light region and a slight high reflectance of approximately 17% in UV region. The reflectance was further reduced in both UV and visible light region through the deposition of a poly(dimethylsiloxane) layer with a rough surface on the Si nanostructure: the reflectance can be decreased down to 2.5%. The enhancement of the antireflection properties was analyzed with a finite difference time domain simulation method.
Type of Medium:
Online Resource
ISSN:
1556-276X
DOI:
10.1186/1556-276X-9-9
Language:
English
Publisher:
Springer Science and Business Media LLC
Publication Date:
2014
detail.hit.zdb_id:
2253244-4
detail.hit.zdb_id:
3149496-1
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