In:
Chinese Journal of Liquid Crystals and Displays, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Vol. 31, No. 3 ( 2016), p. 276-282
Materialart:
Online-Ressource
ISSN:
1007-2780
Originaltitel:
TFT制程中高厚度ITO残留因素的研究
DOI:
10.3788/YJYXS/2016/31/3
DOI:
10.3788/YJYXS20163103.0276
Sprache:
Englisch
,
Chinesisch
Verlag:
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences
Publikationsdatum:
2016
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