In:
IOP Conference Series: Materials Science and Engineering, IOP Publishing, Vol. 711, No. 1 ( 2020-01-01), p. 012099-
Abstract:
Vanadium dioxide films were prepared by magnetron sputtering method. An experimental apparatus for laser damaging VO 2 thin film was set up. Nanosecond laser and picosecond lasers were used to irradiate the thin film. The damage morphology of the thin film under these two kinds of laser was observed by metallographic microscope. Under the action of nanosecond laser, the damage of thin film is mainly thermal damage, which is mainly determined by the energy contained in the laser pulse itself, and the required damage threshold is relatively higher. The zero probability damage threshold of monopulse irradiate the film is about 0.13J/cm 2 .Under femtosecond laser, the damage of thin film is caused by multi-photon ionization and avalanche ionization, and the damage threshold is relatively lower. The zero probability damage threshold of monopulse irradiate the film is about 10.2m J/cm 2 .
Type of Medium:
Online Resource
ISSN:
1757-8981
,
1757-899X
DOI:
10.1088/1757-899X/711/1/012099
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2020
detail.hit.zdb_id:
2506501-4
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