In:
Advanced Materials Research, Trans Tech Publications, Ltd., Vol. 189-193 ( 2011-2), p. 648-652
Abstract:
ZrC coatings were prepared by CVD using ZrCl 4 , C 3 H 6 , and H 2 as the precursors. The mechanisms responsible for the effects of deposition temperature, H 2 flow rate and inlet C/Zr ratio on the ZrC coatings were studied based on the deposition mechanism of ZrC. The results indicate that the ZrC morphologies change from a loose spherical structure to a cauliflower structure, then to a glassy structure as the deposition temperature increases from 1050°C to 1150°C, then to 1250°C. The carbon content in the ZrC coatings increases with increasing the deposition temperature. Higher inlet C/Zr ratio can lead to rough surfaces and higher carbon content. Reasonable H 2 concentration can inhibit carbon deposition, and lead to a cauliflower structure.
Type of Medium:
Online Resource
ISSN:
1662-8985
DOI:
10.4028/www.scientific.net/AMR.189-193
DOI:
10.4028/www.scientific.net/AMR.189-193.648
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2011
detail.hit.zdb_id:
2265002-7
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