In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 10R ( 1999-10-01), p. 6161-
Abstract:
In this paper, we demonstrate the feasibility of a refined one-dimensional (1D) optical proximity correction (OPC) method incorporated into a hierarchical mask data processing system. The correction accuracy was examined using experimental and lithography simulation by application to test patterns of a 1 Gbit dynamic random access memory (DRAM) metal layer. In the case of the 0.16 µm rule, the standard deviation of the refined 1D OPC was reduced to 9 nm, which is 70% of the standard deviation of 13 nm of the conventional 1D OPC method. The proposed OPC system, using an engineering workstation, succeeded in correcting the metal layer in a miniature model of a 1 Gbit DRAM within 2-4 days. Well-designed hierarchical management in the mask data processing system suppressed mask data volume expansion to within 4% compared to the data volume without OPC. These results suggest that the refined 1D OPC method is useful for the correction of 1 Gbit and future DRAM devices.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.6161
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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